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Pattern Evolution of Self-Assembled Quantum Dots Under Biaxial Stresses

Published online by Cambridge University Press:  01 February 2011

Yaoyu Pang  and
Rui Huang
Yaoyu Pang
Affiliation:
steven_pang@mail.utexas.eduUniversity of TexasDepartment of Aerospace Engineering and Engineering MechanicsAustin TX 78712United States
Rui Huang
Affiliation:
ruihuang@mail.utexas.edu, University of Texas, Department of Aerospace Engineering and Engineering Mechanics, Austin, TX, 78712, United States
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Abstract

A stressed epitaxial film can undergo surface instability. The stress field and the interface interaction have profound effects on the dynamics of surface evolution that leads to self-assembled quantum dots. In this paper, by using a nonlinear evolution equation, we investigate pattern evolution of self-assembled quantum dots under general biaxial stresses. It is found that the shape of quantum dots and their spatial ordering are strongly influenced by the relative magnitudes of the biaxial stresses. Linear perturbation analysis and nonlinear numerical simulations are conducted to elucidate the effect of stress anisotropy on the process of self-assembly that selects different patterns.

Keywords

self-assemblyfilmmorphology
Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 921: Symposium T – Nanomanufacturing , 2006 , 0921-T07-08
Copyright
Copyright © Materials Research Society 2006

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