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Photoinduced Low Refractive Index Patterning in a Photosensitive Hybrid Material
Published online by Cambridge University Press: 15 February 2011
Abstract
Light illumination processing created photoinduced reduction of refractive index as well as volume contraction in an organic-inorganic hybrid material. Whereas both refractive index and film thickness are decreased significantly by the light exposure, transmittance and anti-soiling property of the hybrid film are not affected by the exposure. Direct patterning is possible upon light illumination using the photoinduced change in thickness without any developing process.
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- Copyright © Materials Research Society 2003