Hostname: page-component-848d4c4894-v5vhk Total loading time: 0 Render date: 2024-07-04T06:26:25.415Z Has data issue: false hasContentIssue false

Photoluminescence Study of Self-Limiting Oxidation in Nanocrystalline Silicon Quantum Dots

Published online by Cambridge University Press:  17 March 2011

Kenta Arai
Affiliation:
Research Center for Quantum E.ect Electronics, Tokyo Institute of Technology 2-12-1, O-okayama, Meguro-ku, Tokyo 152-8552, JAPAN
Junichi Omachi
Affiliation:
Research Center for Quantum E.ect Electronics, Tokyo Institute of Technology 2-12-1, O-okayama, Meguro-ku, Tokyo 152-8552, JAPAN
Katsuhiko Nishiguchi
Affiliation:
Research Center for Quantum E.ect Electronics, Tokyo Institute of Technology 2-12-1, O-okayama, Meguro-ku, Tokyo 152-8552, JAPAN
Shunri Oda
Affiliation:
Research Center for Quantum E.ect Electronics, Tokyo Institute of Technology 2-12-1, O-okayama, Meguro-ku, Tokyo 152-8552, JAPAN
Get access

Abstract

We have studied photoluminescence (PL) of surface oxidized nanocrystalline silicon quantum dots (QDs) for various oxidation periods and temperatures. With increasing oxidation period, the surface oxide grows and the Si QD core shrinks initially, then retardation of the oxidation process occurs which is ascribed to compressive stress at the interface between Si QD core and oxide. Upon oxidation, the PL spectrum peak shifts toward the shorter wavelength side followed by retardation of the blueshift or even manifestation of the redshift. The origin of PL is due to the localized excitons at the interface between Si QD core and oxide or amorphous SiOx (a-SiOx) formed at the interface. The blueshift is associated with the increased quantum con.nement or increased bandgap of a-SiOx. The redshift is due to the stress e.ect of the bandgap of Si QD core or a-SiOx. We have successfully confirmed the effect of compressive stress associated with the self-limiting oxidation by PL measurement.

Type
Research Article
Copyright
Copyright © Materials Research Society 2001

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

1. Canham, L., Appl. Phys. Lett. 57, 1046 (1990).Google Scholar
2. Kao, D.B., McVittie, J., Nix, W., and Saraswat, K., IEEE, Trans. Electron. Device. 34, 1008 (1987).Google Scholar
3. Kao, D.B., McVittie, J., Nix, W., and Saraswat, K., IEEE, Trans. Electron. Device. 35, 25 (1988).10.1109/16.2412Google Scholar
4. Liu, H., Biegelsen, D., Ponce, F., Johnson, N., and Pease, R., Appl. Phys. Lett. 64, 1383 (1994).Google Scholar
5. Omachi, J., Nakamura, R., Nishiguchi, K., and Oda, S., (Mater. Res. Soc. Proc., Pittsburgh, PA, 2001) in press.Google Scholar
6. Welber, B., Kim, C., Cardona, M., and Rodriguez, S., Solid State Commu. 17, 1021 (1975).Google Scholar
7. Zallet, R. and Paul, W., Phys. Rev. 155, 703 (1967).Google Scholar
8. Weinstein, B., Phys. Rev. B 23, 787 (1981).Google Scholar
9. Ifuku, T., Otobe, M., Itoh, A., and Oda, S., Jpn. J. Appl. Phys. Part1 36, 4031 (1997).Google Scholar
10. Patrone, L., Nelson, D., Safarov, V., Sentis, M., Marine, W., and Giorgio, S., J. Appl. Phys. 87, 3829 (2000).Google Scholar
11. Kanemitsu, Y., Okamoto, S., Otobe, M., and Oda, S., Phys. Rev. B 55, 7375 (1997).Google Scholar
12. Takagahara, T. and Takeda, K., Phys. Rev. B 46, 15578(1992).Google Scholar
13. Holzenkämpfer, E., Richter, F.-W., Stuke, J., and Voget-Grote, U., J. Non Cryst. Solids 32, 327 (1979).Google Scholar
14. Carius, R., Fischer, R., Holzenkämpfer, E., and Stuke, J., J. Appl. Phys. 52, 4241 (1981).10.1063/1.329274Google Scholar