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Preparation of Continuous Mesoporous Films on Porous and Dense Substrates

Published online by Cambridge University Press:  10 February 2011

J. Liu
Affiliation:
Daepartment of Materials and Chemical Science, Pacific Northwest National Laboratory, Battelle Boulevard, Box 999, Richland, WA 99352
J. R. Bontha
Affiliation:
Daepartment of Materials and Chemical Science, Pacific Northwest National Laboratory, Battelle Boulevard, Box 999, Richland, WA 99352
A. Y. Kim
Affiliation:
Daepartment of Materials and Chemical Science, Pacific Northwest National Laboratory, Battelle Boulevard, Box 999, Richland, WA 99352
S. Baskaran
Affiliation:
Daepartment of Materials and Chemical Science, Pacific Northwest National Laboratory, Battelle Boulevard, Box 999, Richland, WA 99352
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Abstract

High quality, continuous mesoporous films are prepared on both porous and dense substrates. An interfacial reaction mechanism is used to grow mesoporous films within the pores of porous supports using a diffusion cell reactor. The porous support was placed between two compartments containing a silicate solution in one compartment and a surfactant solution in the other. The silicate and surfactant solutions diffused into the support to form a mesoporous film at the liquid-liquid interface. This method produces a transparent film free from large defects. Spincoating technique is also used to prepare mesoporous films on dense substrates. These films have uniform thickness and show well-defined interference depending on the film thickness.

Type
Research Article
Copyright
Copyright © Materials Research Society 1996

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