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Process Windows and Properties of Tungstenand Vanadium-Oxides Deposited by MSIP-PVD-Process

Published online by Cambridge University Press:  10 February 2011

O. Knotek ,
E. Lugscheider ,
S. Bäarwulf  and
C. Barimani
O. Knotek
Affiliation:
Materials Science Institute, University of Technology Aachen, Augustinerbach 4-22, 52056 Aachen, Germany
E. Lugscheider
Affiliation:
Materials Science Institute, University of Technology Aachen, Augustinerbach 4-22, 52056 Aachen, Germany
S. Bäarwulf
Affiliation:
Materials Science Institute, University of Technology Aachen, Augustinerbach 4-22, 52056 Aachen, Germany
C. Barimani
Affiliation:
Materials Science Institute, University of Technology Aachen, Augustinerbach 4-22, 52056 Aachen, Germany
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Abstract

The tungsten and vanadium oxides are well known to be usable as solid lubricants at elevated temperatures. Such metal-oxides are interesting for tribological insets at atmospheric conditions because of their “oxidation stability”. This paper reports about investigations made to find stable process windows for the deposition of tungsten and vanadium oxides in a reactive d.c. mode by the MSIP-PVD-process. One focus of the study is on the metal oxide-phases generated in the MSIP-process under various conditions and their mechanical and metallographic properties. Coatings were deposited, developed and analyzed by standard testing methods such as SEM, microhardness (nanoindentation), XRD and scratch testing to characterize the mechanical and structural properties. Stable process windows will be presented for the reactive mode as well as the influence of different process parameters to the microstructure and the material properties. It will be shown that it is possible to deposit vanadium-oxides despite contamination effects in wide ranges by adapting the gas-flow. Process failure was determined at 15 - 18 % oxygen partial pressure for reactively deposited tungsten oxides.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 555: Symposium OO – Properties and Processing of Vapor-Deposited Coatings , 1998 , 53
Copyright
Copyright © Materials Research Society 1999

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