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Properties of Chlorine-Doped Zinc Selenide Grown by Molecular Beam Epitaxy

Published online by Cambridge University Press:  21 February 2011

S. Hwang
Affiliation:
Department of Physics, North Carolina State University, Raleigh, North Carolina 27695-8202
J. Ren
Affiliation:
Department of Physics, North Carolina State University, Raleigh, North Carolina 27695-8202
K.A. Bowers
Affiliation:
Department of Physics, North Carolina State University, Raleigh, North Carolina 27695-8202
J.W. Cook Jr.
Affiliation:
Department of Physics, North Carolina State University, Raleigh, North Carolina 27695-8202
J.F. Schetzina
Affiliation:
Department of Physics, North Carolina State University, Raleigh, North Carolina 27695-8202
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Abstract

ZnSe:Cl epilayers have been grown on (100) GaAs by MBE using a Zn to Se beam flux ratio of 2:1 and substrate temperatures as low as 225 °C. The ZnSe:Cl epilayers are highly conducting and exhibit bright blue-violet edge luminescence at 300 K. A mobility of 2480 cm2 /V-s at 40 K was measured for an n-type ZnSe:CI film that was Cl-doped to ∼2.3×1017 cm−3 and for which a compensation ratio (NA/ND) of ∼3% was calculated. Carrier concentrations as large as 6.7×1018cm−3 were obtained by increasing the temperature of the MBE oven containing the C1 dopant.

Type
Research Article
Copyright
Copyright © Materials Research Society 1990

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References

REFERENCES

1. Bhargava, R.N., J. Crystal Growth 86, 873 (1988).Google Scholar
2. Yao, T., J. Crystal Growth 72, 31 (1985).Google Scholar
3. Ohkawa, K., Mitsuyu, T., and Yamazaki, O., J. Appl. Phys. 62, 3216 (1987).Google Scholar
4. Yoshikawa, A., Nomura, H., Yamaga, S., and Kasai, H. J. Appl. Phys. 65, 1223 (1989).Google Scholar
5. Harris, K.A., Hwang, S., Blanks, D.K., Cook, J.W. Jr., Otsuka, N., and Schetzina, J.F., J. Vac. Sci. Technol. A 4, 2061 (1986).Google Scholar
6. Cook, J.W. Jr., Eason, D.B., and Harris, K.A., presented in the 10th Molecular Beam Epitaxy Workshop, Raleigh, North Carolina, September 13-15, 1989.Google Scholar
7. Koukitu, A., Nakai, H., Suzuki, T., and Seki, H., J. Crystal Growth 84, 425 (1987).Google Scholar
8. Zhu, Z., Nomura, T., Miyao, M., and Hagino, M., J. Crystal Growth 95, 529 (1989).Google Scholar
9. Blakemore, J.S., Solid State Physics, 2nd ed. (Cambridge University Press, Cambridge, 1985), p.320.Google Scholar
10. Kartheuser, E., Evrard, R., and Williams, F., Phys. Rev. B 21, 648 (1980).Google Scholar
11. Rode, D.L., Phys. Rev. B 2, 4036 (1970).Google Scholar
12. Hwang, S., Ph.D. Thesis, North Carolina State University, 1988.Google Scholar
13. Woodbury, H.H., Phys. Rev. B 9, 5188 (1974).Google Scholar
14. Yao, T., Ogura, M., Matsuoka, S., and Morishita, T., Appl. Phys. Lett. 43, 499 (1983).Google Scholar