Hostname: page-component-848d4c4894-4rdrl Total loading time: 0 Render date: 2024-07-04T15:15:49.599Z Has data issue: false hasContentIssue false

Properties of Ohmic Contacts to Heterojunction Transistors

Published online by Cambridge University Press:  25 February 2011

H. Barry Harrison*
Affiliation:
School of Microelectronic Engineering, Griffith University, Brisbane, Australia 4111
Get access

Abstract

The electrical and physical properties of the contact between the active channel of high electron mobility transistors (HEMT’s) and the source or drain contacts play an important role in determining the transistor characteristics. This paper considers electrical models that may be applied to the various techniques now available to form these Interconnections. Results of electrical (and some physical) studies with regard to these systems are then discussed and compared where possible with predictions made using the electrical models. The comparisons show that the electrical models provide a useful base to identify the important parameters in these interconnections.

Type
Research Article
Copyright
Copyright © Materials Research Society 1990

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

1. Stormer, H., Dingle, R., Gossard, A.C., Wiegmann, W. and Sturge, M, Solid State Comm. Un., Vol 29, 1979, p705.CrossRefGoogle Scholar
2. Mimura, T., Hiyamizu, S., Fusii, T. and Nanbu, K., Japan.J.Appl.Phys., vol.19, 1980, pL225.CrossRefGoogle Scholar
3. Morkoc, H. and Solomon, T., IEEE Spectrum, Feb. 1984, p28.CrossRefGoogle Scholar
4. Kiehl, R.A., Fever, M.D., Hendel, R.H., Hwang, J.C.M., Keramidas, V.G., Allyn, C.L and Dingle, R., IEEE Electron Device Letters, Vol. EDL–4, 1983, p377.CrossRefGoogle Scholar
5. Abe, M., Mimura, T., Yokoyama, N. and Ishikana, H., IEEE Trans. Microwave Theory Tech., Vol.Mtt–30, 1982, p992.CrossRefGoogle Scholar
6. Feuer, M.D., IEEE Trans, on Elec Dev., Vol.Ed–32, 1985, p7.CrossRefGoogle Scholar
7. Shewai, K., IEEE Trans, on Elec.Dev., Vol.Ed–34, 1987, p1642.Google Scholar
8. Barnes, P.A. and Cho, A.Y., Appl.Phys.Lett., Vol 33, Dec. 1978, p1022.Google Scholar
9. Peng, C.K., Ji, G., Kumar, N.S. and Morkoc, H., Appl.Phys.Lett. 53(10), Sept. 1988, p900.CrossRefGoogle Scholar
10. Lee, S.J. and Crowell, C.A., Solid-State Elec, Vol 28(7), 1985, p659.CrossRefGoogle Scholar
11. Reeves, G.K. and Harrison, H.B., IEEE Electron Devices, Vol 3, 1986, p328.CrossRefGoogle Scholar
12. Harrison, H.B. and Reeves, G.K.. Electronic Letters, Vol 18(25), Dec. 1982, p1083.Google Scholar
13. Kajiyama, K.. Mizushima, Y. and Sakata, S., Appl.Phys.Lett., Vol 23, 1973, p458.CrossRefGoogle Scholar
14. Berger, H., J.Electrochem.Soc, Vol 119, 1972, p507.CrossRefGoogle Scholar
15. Reeves, G.K. and Harrison, H.B., IEEE Electron.Dev.Lett., Vol EDL–3 (5), 1982, p111.CrossRefGoogle Scholar
16. Braslau, N., J.Vac.Sci.Technol., Vol 19(3), 1981, p803.CrossRefGoogle Scholar
17. Piotrowsha, , Gulvarc’h, A. and Pelous, G., Solid-State Electron., Vol 25(3), 1983, p179.CrossRefGoogle Scholar
18. Stall, R., Wood, C.E.C., Board, K. and Eastman, L.F., Electron.Lett., Vol 15(24), Nov. 1979, p800.CrossRefGoogle Scholar
19. Pianetta, P.A., Stolle, C.A. and Hansen, J.L., Appl.Phys.Lett., Vol 36(7), 1980, p597.CrossRefGoogle Scholar
20. Harrison, H.B. and Williams, J.S.. Laser and Electron Bean Processing of Materials, Eds. White, C.W. and Peescy, P.S., Academic Press, N.Y., 1980, pGoogle Scholar
21. Feuer, M.D., IEEE Trans. Electron Devices, Vol Ed–32(1), 1985, p7.CrossRefGoogle Scholar
22. Jones, W.L. and Eastman, L.F., IEEE Trans, on Elec.Dev., Vol Ed33(5), 1986, p712.CrossRefGoogle Scholar
23. Goronkin, H., Tehrani, S., Remmel, T., FeJes, P.L. and Johnson, K.J., IEEE Elec.Dev., Vol Ed 36(2), 1989, p281.CrossRefGoogle Scholar
24. Elis, A., Rai, A.K. and Langer, D.W., Electronics Letters, Vol 23(3), 1987, p113.Google Scholar
25. Kamada, M., Suzuki, T., Nakamura, F., Mori, Y. and Arai, M., Appl.Phys.Lett., 49(19), 1986, p1263 CrossRefGoogle Scholar
26. Kachwalla, Z.S., King, W.D. and Harrison, H.B., In Press.Google Scholar
27. Kachwalla, Z.S., King, W.D. and Wiggins, J., IREE Con. Digest of Technical Papers, Melbourne 1989, p511.Google Scholar
28. Kuroda, S., Harada, N., Katakami, T. and Mimura, T., IEEE Elec.Dev.Lett., Vol Ed 8(9), 1987, p389.CrossRefGoogle Scholar
29. Kelterson, A., Ponse, F., Henderson, T., Klem, J. and Morkoc, H., J.Appl.Phys., Vol 57, 1985, p2305.CrossRefGoogle Scholar
30. Kuroda, S., Marada, N., Katakami, T., Mimura, T. and Abe, M., IEEE Transactions of Elec.Dev., Vol 36(10), 1989, p2196.CrossRefGoogle Scholar