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Rapid Photo-Thermal Chemical Vapor Deposition of Amorphous Carbon From Diiodomethane

Published online by Cambridge University Press:  10 February 2011

M. Lindstam ,
M. Boman  and
K. Piglmayer
M. Lindstam
Affiliation:
Uppsala University, Ångström Laboratory, Department of Inorganic Chemistry, Box 538, SE-75121 Uppsala, Sweden
M. Boman
Affiliation:
Uppsala University, Ångström Laboratory, Department of Inorganic Chemistry, Box 538, SE-75121 Uppsala, Sweden
K. Piglmayer
Affiliation:
Johannes Kepler University, Institute of Experimental Physics, Department of Applied Physics, A-4040 Linz, Austria
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Abstract

A novel approach to deposit amorphous carbon from the precursor CH2I2 at low cost and high efficiency is reported. The combination of thermal and quantum photo effects shows new interesting growth behaviour. The radiation of a halogen-lamp was used to heat the substrate material and to split photolytically the precursor molecules above the substrate surface. The deposition process was investigated as a function of lamp power, gas phase partial pressures and substrate materials. The films were analysed by Raman spectroscopy, scanning electron microscopy, energy dispersive x-ray spectroscopy, x-ray photon spectroscopy, transmission electron microscopy and atomic force microscopy.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 593: Symposium U – Amorphous & Nanostructured Carbon , 1999 , 279
Copyright
Copyright © Materials Research Society 2000

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References

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