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Reaction of Amorphous Minb Films with Crystalline Metal Overlayers

Published online by Cambridge University Press:  26 February 2011

E. A. Dobisz ,
B. L. Doyle ,
J. H. Perepezko ,
J. D. Wiley  and
P. S. Peercy
E. A. Dobisz
Affiliation:
University of Wisconsin-Madison, 1500 Johnson Drive, Madison, WI 53706
B. L. Doyle
Affiliation:
Sandia National Laboratories, Albuquerque, NM 87185
J. H. Perepezko
Affiliation:
University of Wisconsin-Madison, 1500 Johnson Drive, Madison, WI 53706
J. D. Wiley
Affiliation:
University of Wisconsin-Madison, 1500 Johnson Drive, Madison, WI 53706
P. S. Peercy
Affiliation:
Sandia National Laboratories, Albuquerque, NM 87185
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Abstract

In many cases the stability of amorphous films is influenced by interaction with metallic crystalline overlayers. Such interactions between Au, Ni, Nb and Ta overlayers and a-(Ni-Nb) films are reported. During interdiffusion Au overlayers reacted with a-(Ni-Nb) to form two different adjacent crystalline layers. In order to study the influence of relaxation of the amorphous film on overlayer reaction several a-(Ni-Nb) samples were pre-annealed prior to Au deposition. High depth resolution Rutherford Backscattering Spectrometry (RBS) demonstrates that preannealing lowers the diffusion poefficient of Au in a-(Ni-Nb) at 4500C from 7.5×10−22 m2/s to 8.7×10−23 m22/s. During interdiffusion Ta was discovered to be substantially more inert than Au. For example, negligible interdiffusion between Ta and a-(Ni-Nb) at 505°C after 25 hours implies a diffusivity of less than 5×10−24 m2/s. These observations allow assessment of some of the requirements for increasing the stability of crystalline-amorphous metal film layered structures.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 37: Symposium D – Layered Structures, Epitaxy, and Interfaces , 1984 , 479
Copyright
Copyright © Materials Research Society 1985

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