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Rheed Intensity Observation of AlAs and GaAs by in situ Etching Using Arsenic Tribromide

Published online by Cambridge University Press:  15 February 2011

T. Kaneko ,
T. Säger  and
K. Eberl
T. Kaneko
Affiliation:
Max-Planck-Institut für Festkörperforschung, Stuttgart 70569, Germany
T. Säger
Affiliation:
Max-Planck-Institut für Festkörperforschung, Stuttgart 70569, Germany
K. Eberl
Affiliation:
Max-Planck-Institut für Festkörperforschung, Stuttgart 70569, Germany
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Abstract

The first in situ layer-by-layer etching of AlAs(100) surfaces has been observed by using RHEED intensity oscillations technique and is contrasted with the results obtained for the etching of GaAs(100). The experiments were conducted by introducing the etchant, arsenic tribromide, directly into a conventional MBE chamber without the use of any carrier gas. RHEED intensity oscillations during the etching of AlAs are observed between 350 and 760°C indicating a continuous increase in the etching rate with temperatures, with no supply rate limiting conditions being reached. Conversely, oscillations from GaAs reveal a reaction rate limited region at low temperatures (≤500°C) and a supply rate limited region at higher temperature(>500°C). The maximum selectivity in the etching rates between GaAs and AlAs is obtained at 450°C (40:1). The selectivity, and the ability to monitor the layer-by-layer process by RHEED intensity oscillations is foreseen to be of great importance for more controlled fabrications of AlAs and GaAs heterointerfaces.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 405: Symposium K – Surface/Interface and Stress Effects in Electronic Materials Nanostructures , 1995 , 67
Copyright
Copyright © Materials Research Society 1996

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