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The Role of Adsorption and Vapor Pressure in Focused Ion Beam Induced Deposition of Carbon Films

Published online by Cambridge University Press:  21 February 2011

S.J. Kirch  and
D.E. Seeger
D.E. Seeger
Affiliation:
IBM Research Division, T.J. Watson Research Center; Yorktown Heights, NY 10598
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Abstract

Focused ion beam induced deposition of carbon from various organic molecules was studiedfor a range of temperatures and pressures. To study the effects of vapor pressure, deposition from styrene was compared to deposition from 2-chloro and 2-bromo styrene. To study the effects of the double bond on the vinyl substituent, deposition from ethyl benzeneand 2-bromo ethyl benzene was compared to deposition from the 2-X-styrene materials. Foreach material, deposition yield is found to scale with vapor pressure as a function of temperature over the range studied (0 - 25 C). This behavior shows that physical adsorption plays the key role in determining deposition properties. The importance of the doublebond observed in previous work is simply a manifestation of enhanced physical adsorptiondue to the presence of this double bond.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 158: Symposium B – In-Situ Patterning: Selective Area Deposition and Etching , 1989 , 229
Copyright
Copyright © Materials Research Society 1990

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References

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