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Selective Titanium Oxide Formation Using Electron-beam Induced Carbon Deposition Technique

Published online by Cambridge University Press:  11 February 2011

Thierry Djenizian ,
Jan Macak  and
Patrik Schmuki
Thierry Djenizian
Affiliation:
Dept. of Materials Science, LKO, University of Erlangen-Nuremberg, Martensstrasse 7, D-91058, Erlangen, Germany
Jan Macak
Affiliation:
Dept. of Materials Science, LKO, University of Erlangen-Nuremberg, Martensstrasse 7, D-91058, Erlangen, Germany
Patrik Schmuki
Affiliation:
Dept. of Materials Science, LKO, University of Erlangen-Nuremberg, Martensstrasse 7, D-91058, Erlangen, Germany
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Abstract

The present work describes the selective titanium oxide formation based on electron-beam (e-beam) induced carbon deposition used as a mask against chemical dissolution. Under ideal conditions the C-deposits act as a negative resist to hinder the titanium oxide dissolution at e-beam treated locations. Carbon patterns were written in a scanning electron microscope at different electron doses on titanium oxide electrochemically grown in 1 M NaOH by potentiostatic experiments. Subsequently, the untreated areas were chemically removed in 0.5 % HF leaving the C-protected TiO2 patterns at the Ti surface. The selectivity of the technique depends on several factors such as the electron dose during masking and the chemical parameters. Under ideal conditions, it is demonstrated that direct patterning of surfaces as well as the fabrication of microstructures can be achieved using such technique.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 741: Symposium J – Nano- and Microelectromechanical Systems (NEMS and MEMS) and Molecular Machines , 2002 , J4.5
Copyright
Copyright © Materials Research Society 2003

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References

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