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Spectroscopy of III–Vs Under Hydrostatic Pressure

Published online by Cambridge University Press:  26 February 2011

R. A. Stradling*
Affiliation:
Physics Department, Imperial College of Science and Technology, London, SW7 2BZ, U.K.
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Abstract

In GaAs and InSb common residual contaminants introduce both shallow donor states and other levels normally resonant with the conduction band but taking their predominant character from higher conduction band minima. These states can be made to emerge into the forbidden gap by applying hydrostatic pressure. Judged by the measured pressure coefficients two sets of levels are closely tied to the L- and X-conduction band minima. At low temperatures the X-associated states show local relaxation effects and metastability (i.e., D(X) behaviour). Pressure experiments have also been performed with spike-doped GaAs both in single layer and in superlattice form. Shubnikov-de Haas peaks can be observed above 3T. Fourier analysis of these shows that up to six sub-bands can be occupied. The application of hydrostatic pressure of up to 20kbar dramatically increases the mobility of the electrons in the lowest sub-band by as much as an order of magnitude with smaller increases occurring the higher sub-bands. The increases in mobility arise from the diffusion of the silicon donors during growth. Localised donor states associated with the L-conduction band drop below the Fermi energy in the centre of diffused distribution of donors on the application of pressure and become neutralised. This reduction of ionised scattering centres affects the most confined electron states and thus the mobility of the lowest sub-band increases very substantially.

Type
Research Article
Copyright
Copyright © Materials Research Society 1988

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References

REFERENCES

[1]Barnett, J.D., Block, S., and Piermarini, G.J.. Rev. Sci. Inst. 44 1 1973) and B. Welber, Rev. Sci. Inst. 47, 183 (1976).Google Scholar
[2]Wasilewski, Z., Porowski, S., and Stradling, R.A.. J. Phys. E, 19, 480 (1986), also Solid State Comm. 57, 123 (1986).Google Scholar
[3]Konczewicz, L., Litwin-Staszewska, E., and Porowski, S., Proc. 3rd Conf. on Narrow Gap Semiconductros (Warsaw 1977), p. 211.Google Scholar
[4]Porowski, S., Proc. of the 4th Int. Conf. on Narrow Gap Semiconductors (Linz 1980), p. 420.Google Scholar
[5]Porowski, S., Konczewicz, L., Konczykowski, M., Aulombard, R. and Robert, J.L., in: Proc. Int. Conf. on Phys. of Semiconductors (Kyoto 1980), p. 271.Google Scholar
[6]Litwin-Staszewska, ., Szymonska, W., and Piotrzkowski, R.. Springer Lecture Notes in Physics (Narrow Gap Semiconductors) 152. [/ 397 (1981).Google Scholar
[7]Wasilewski, Z., Davidson, A.M., Stradling, R.A., and Porowski, S., Lecture Notes in Physics 177, p. 233. “Applications of High Magnetic Fields to Semiconductor Physics” (Grenoble 1982).Google Scholar
[8]Baj, M., Brunel, L.C., Huant, S., Trzeciakowski, W., Wasilewski, Z., and Stradling, R.A., Proc. Int. Conf. on Physics of Semiconductors (San Francisco 1984); C.J. Armistead, F. Kuchar, S.P. Najda, S. Porowski, C. Sotomayor-Torres, R.A. Stradling and Z. Wasilewski, Proc. Int. Conf. on Physics of Semiconductors (San Francisco 1984).Google Scholar
[9]Wasilewski, Z., and Stradling, R.A.. Semicond. Sci. and Tech. 1, 264 (1986).Google Scholar
[10]Stillman, G.E., Larsen, D.M., Wolfe, C.M., and Dimmock, J.O.. Solid State Comm. 9, 2245 (1971).Google Scholar
[11]Kobayashi, M., Yokoyama, T., and Narita, S., Jap. J. App. Phys. 22, 2612 (1983)Google Scholar
[12]Leröux, M., Pelous, G., Raymond, F., and Verie, C.. App. Phys. Lett. 46, 288 (1985)Google Scholar
[13]Wolford, D.J., and Bradley, J.A., Solid State Comm. 53, 1069 (1985).Google Scholar
[14]Maude, D.K., Portal, J.C., Dmowski, L., Eaves, L., Nathan, M., Heiblum, M., Harris, J.J., and Beall, R.R.. Phys. Rev. Lett. 59, 815 (1987).Google Scholar
[15]Tachikawa, M., Fujisawa, T., Kukimoto, M., Shibata, A., Oomi, G., and Minomura, S.. Jap. J. Appl. Phys. 24, L893 (1985).Google Scholar
[16]Dmochowski, J.E., Langer, J.M., Raczyuska, J. and Jantsch, W., to be publishedGoogle Scholar
[17]Koch, F., Zrenner, A., and Zachau, M.. Springer Series in Solid State Sciences Two Dimensional Systems 67, p175 (1986).Google Scholar
[18]Zrenner, A., Reisinger, H., Koch, F., Ploog, K., J.C. Maan. Phys. Rev. B 33, 5607 (1986).Google Scholar