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Stress Driven Patterning of Epitaxial Films

Published online by Cambridge University Press:  21 February 2011

Michael A. Grinfeld*
Affiliation:
Rutgers University, Department of Mathematics, New Brunswick, NJ 08903
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Abstract

We study possible morphologies of epitaxial films atop attractive substrates appearing as a result of competition of misfit stresses, van der Waals forces and surface energy. Corresponding formula for the critical thickness of the dislocation-free Stranski-Krastanov pattern is established for the isotropic deformable films and substrates. If the film thickness exceeds the critical magnitude the layer-by-layer pattern switches to islanding. At the first stage the islands have a shape of striae (i.e. long parallel trenches with periodic spacing). We discuss also i)the circumstances in which surface morphology of the film corresponds to a two-dimensional superlattice of islands rather than a one dimensional lattice of striae and ii)the influence of a buffer inter-layer.

Type
Research Article
Copyright
Copyright © Materials Research Society 1994

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References

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