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Structural and Magnetic Properties of Ion Beam Deposited Nanocrystalline Al-Co and Al-Co-O Films

Published online by Cambridge University Press:  03 September 2012

H. R. Khan  and
F. Brouers
H. R. Khan
Affiliation:
Material Physics, FEM, 73525 Schwäbisch Gmünd, Germany
F. Brouers
Affiliation:
Department of Materials Science, University of Liège, Liège, Belgium
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Abstract

Nanocrystalline films of Al-Co and Al-Co-O are deposited on glass substrates using Ar and (Ar + O2) gas mixture by IB and IAB deposition techniques. The structure of the films is investigated by X-ray diffraction. Annealed (500°C/ 0.5 h / Vacuum) films show a preferred Co<111> + Al<200> crystallographic orientation. The crystallite size estimated from the line broadening of Co<111> + Al<2007gt;reflections lies between 4 and 12 nm. The value of Mx/Ms increases with decreasing Co concentration from 0.2 (74 at.%) to 0.4 (46 at.%) for IB(Ar) films, where Mr and Ms are the remanence and saturation magnetizations respectively. IB (Ar + O2) and IAB (Ar + O2) films of the same composition A154Co46Ox show different magnetic behaviour.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 438: Symposium A – Materials Modificaton and Synthesis by Ion Beam… , 1996 , 531
Copyright
Copyright © Materials Research Society 1997

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