Hostname: page-component-77c89778f8-n9wrp Total loading time: 0 Render date: 2024-07-20T15:29:37.090Z Has data issue: false hasContentIssue false
  • English
  • Français

Structural and optical properties of delafossite-type CuAlO2 thin films prepared by RF reactive sputtering

Published online by Cambridge University Press:  26 February 2011

B. Yang ,
Y. M. Lu ,
C. Neumann ,
A. Polity ,
C. Z. Wang  and
B. K. Meyer
B. Yang
Affiliation:
bin.yang@exp1.physik.uni-giessen.de
Y. M. Lu
Affiliation:
Yinmei.Lu@exp1.physik.uni-giessen.de
C. Neumann
Affiliation:
christian.neuman@exp1.physik.uni-giessen.de
A. Polity
Affiliation:
angelika.polity@exp1.physik.uni-giessen.de
C. Z. Wang
Affiliation:
mailto:Changzhong.Wang@exp1.physik.uni-giessen.de
B. K. Meyer
Affiliation:
Bruno.K.Meyer@exp1.physik.uni-giessen.de, Justus Liebig Universität, 1. Physikalisches Institut, Germany
Get access

Abstract

Delafossite-type CuAlO2 thin films have been deposited by radio frequency (RF) reactive sputtering on sapphire using a CuAlO2 ceramic target. A study of structural and optical properties was performed on films of varying deposition parameters such as substrate temperature and oxygen partial pressure and also post annealing. The crystalline phase in the films was identified to be the delafossite structure by x-ray diffraction. The optical properties, such as the wavelength dependence of the transmittance and the band gap, were determined. The average transmittance is 80% in the wavelength range of 400-1500 nm and the band gap is 3.81 eV.

Keywords

sputteringoxideCu
Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 905: Symposium DD – Materials for Transparent Electronics , 2005 , 0905-DD05-09
Copyright
Copyright © Materials Research Society 2006

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

[1] Hamberg, I., Granqvist, C. G., J. Appl. Phys., 60, R123 (1986).Google Scholar
[2] Tang, W., Cameron, D. C., Thin Solid Films, 238, 83, (1994).Google Scholar
[3] Chopra, K. L., Major, S., Pandya, D. K., Thin Solid Films, 102, 1, (1983).Google Scholar
[4] Dawar, A. L and Joshi, J. C., J. Mater. Sci., 19, 1, (1984).Google Scholar
[5] Cachet, H., Gamard, A., Campet, G., Jousseaume, B., Toupance, T., Thin Solid Films, 388, 41, (2001).Google Scholar
[6] Kawazoe, H, Yasukawa, M., Hyodo, H., Kuita, M., Yanagi, H., and Hosono, H., Nature, 389, 939, (1997).Google Scholar
[7] Gong, H., Wang, Y., and Luo, Y., Appl. Phys. Lett., 76, 3959, (2000).Google Scholar
[8] Yang, B., Zhang, X. J., Zhang, S T., Chen, X. Y., Wu, Z. C., Chen, Y. F., Zhu, Y. Y., Liu, Z. G., and Ming, N. B., Appl. Phys. Lett., 79, 4559, (2001).Google Scholar