Hostname: page-component-5c6d5d7d68-vt8vv Total loading time: 0.001 Render date: 2024-08-15T01:51:00.487Z Has data issue: false hasContentIssue false

Structure and Morphology of Vitreous Chalcogenide Thin Films Obtained by Plasma-Enhanced CVD

Published online by Cambridge University Press:  21 February 2011

Michel Ribes
Affiliation:
Laboratoire de Physicochimle des Matbrlaux Solides, U.R.A. D0407, USTL, Place Eugene Bataillon, 34095 Montpellier Cedex 2, France
Bernard Cros
Affiliation:
Laboratoire de Physicochimle des Matbrlaux Solides, U.R.A. D0407, USTL, Place Eugene Bataillon, 34095 Montpellier Cedex 2, France
Serge Peytavin
Affiliation:
Laboratoire de Physicochimle des Matbrlaux Solides, U.R.A. D0407, USTL, Place Eugene Bataillon, 34095 Montpellier Cedex 2, France
Henri Camon
Affiliation:
CEMES-LOE, 29, rue Jeanne Marvlg, 31055 Toulouse, France
Jean-Louis Balladore
Affiliation:
CEMES-LOE, 29, rue Jeanne Marvlg, 31055 Toulouse, France
Get access

Abstract

Thin films of chalcogenide glasses GeSeywere prepared by PECVD for lithographic applications. Their structure and morphology were characterized by EXAFS and electron microscopy. EXAFS studies enabled comparison of the structures of thin films and those of homologous bulk glasses. Morphology studies by SEM and TEM revealed an heterogeneous structure explained by a phase separation: these glasses consist of microdomains whose size varies with the overall GeSey composition.

Type
Research Article
Copyright
Copyright © Materials Research Society 1990

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

1. Yoshikawa, A., Ochi, O, Nagai, H. and Mizushima, Y., Appl. Phys. Lett., 29, 677 (1976); 31, 161 (1977); A. Yoshikawa, O Ochi and Y. Mizushima, Appl. Phys. Lett., 36, 107 (1980).Google Scholar
2. Shimizu, I., Sakuma, H., Kokado, H. and Inoue, E., Photogr. Sci. Eng. 16, 291 (1972).Google Scholar
3. Chang, M.S., Hou, T.W., Chen, J.T., Kolwicz, K.D. and Zenel, J.N., J. Vac. Sci. Technol. 16, 1973 (1979).Google Scholar
4. Ribes, M., Cros, B. and Julien, P., Optical Microlithographic Technology for Integrated Circuit Fabrication and Inspection, Stover, H. L. and Wittecoek, S. Chairs/Editors, SPIE 811, 202 (1987); P. Julien, E. Granneman, B. Cros and M. Ribes, Vide Couches Minces 237 suppl., 37 (1987).Google Scholar
5. Ong, E., Tai, K.L., Vadimsky, R.G., Kemmerer, C.T. and Bridenbaugh, P.M., SPIE 539, 52 (1985).Google Scholar
6. Cros, B., Camon, H., Brocheton, Y., Gonchond, J.P., Tissier, A., Balladore, J.L. and Ribes, M., J. Phys. 50,C5343 (1989).Google Scholar
7. Peyroutou, C., Peytavin, S., Ribes, M. and Dexpert, H., J. Solid State Chem. 81, 78 (1989).Google Scholar
8. Peyroutou, C., Peytavin, S., Ribes, M. and Dexpert, H., J. Solid State Chem. 81, 70 (1989).Google Scholar
9. Phillips, J.C., Phys. Rev. B 31–12, 8157 (1985).Google Scholar
10. Bresser, W., Boolchand, P. and Suranyi, P., Phys. Rev. Lett., 56, 2493 (1986).Google Scholar