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Structure, Mechanical Properties, and Oxidation Behavior of Nanolayered MoSi2/SiC Coatings

Published online by Cambridge University Press:  25 February 2011

J-P. Hirvonen ,
R Lappalainen ,
H. Kattelus ,
J. Likonen ,
I. Suni ,
H. Kung ,
T.R. Jervis  and
M. Nastasi
J-P. Hirvonen
Affiliation:
Technical Research Centre of Finland, Metallurgy Laboratory, 02151 Espoo, Finland
R Lappalainen
Affiliation:
University of Helsinki, Department of Physics, 01700 Helsinki, Finland
H. Kattelus
Affiliation:
Technical Research Centre of Finland, Semiconductor Laboratory, 02151 Espoo, Finland
J. Likonen
Affiliation:
Helsinki University of Technology, Centre for Chemical Analysis, 02151 Espoo, Finland
I. Suni
Affiliation:
Technical Research Centre of Finland, Semiconductor Laboratory, 02151 Espoo, Finland
H. Kung
Affiliation:
Los Alamos National Laboratory, Materials Science and Technology Division, Los Alamos, NM 87545, USA
T.R. Jervis
Affiliation:
Los Alamos National Laboratory, Center for Materials Science, Los Alamos, NM 87545, USA
M. Nastasi
Affiliation:
Los Alamos National Laboratory, Materials Science and Technology Division, Los Alamos, NM 87545, USA
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Abstract

The structure, hardness and elastic properties, and oxidation behavior of a nanolayered MoSi2/SiC structure were examined. DC magnetron and rf diode sputtering were used to deposit MoSi2 and SiC, respectively. The total number of sublayers of each kind was 90. The nominal thickness of the MoSi2 sublayers was 10 and that of the SiC 3 nm. The microstructure of the as-deposited samples was amorphous whereas annealing at 500 °C for I h resulted in the transformation of MoSi2 into C40 type hexagonal structure as determined using cross-section transmission electron microscopy (TEM). However, silicon carbide still remained amorphous. Hardness and Young's modulus were determined by using a nanoindentation technique. Hardness of 11.6 and 20.8 GPa were obtained for the asdeposited and annealed structure, respectively. Corresponding Young's moduli were 220 and 290 GPa, which yield values of 232 and 332 GPa for Young's moduli of amorphous and crystalline MoSi2. Oxidation tests were carried out in wet oxidation conditions at 400 and 500 °C. The degree of oxidation was determined by measuring oxygen concentration on the surface using a nuclear reaction 16O(d,p) 17O at a deuterium energy of 950 keV. The MoSi2/SiC coating gave good protection against oxidation for unalloyed steel. As compared to a single MoSi2 coating a slightly higher degree of oxidation and a significantly different mechanism of oxidation was observed. This was also supported by secondary ion mass spectroscopy (SIMS) measurements. Cracking of the coating caused by a thermal mismatch and transformation stresses was worse in the case of the single MoSi2 layer than in the case of the composite coating. Thus cracking of the coating can be significantly reduced by using a nanolayered structure.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 286: Symposium J – Nanophase and Nanocomposite Materials , 1992 , 373
Copyright
Copyright © Materials Research Society 1993

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References

REFERENCES

[1] Schlichting, J., High Temperatures - High Pressures 10 241 (1978).Google Scholar
[2] Hirvonen, J-P., Kattelus, H., Suni, I., Likonen, J., Jeris, T.R., and Nastasi, M., NATO ASI on Mechanical Properties and Deformation Behavior of Materials Having Ultra-Fine Microstructure, Portugal, July 1992. In print.Google Scholar
[3] Goldschmidt, H.J., Interstitials Alloys (Butterworth and Co, GB, 1967)Google Scholar
[4] Hirvonen, J-P., Lappalainen, R., Anttila, A., and Sirviö, E., in Plasma Surface Engineering, Edited by Broszeit, E., Muz, W.D., Oeschner, H., Rie, K-T., and Wolf, G.K., pp. 721–728 (DGM Informationsgesellschaft mbH, Germany, 1989).Google Scholar
[5] Chou, T.C. and Nieh, T.G., Thin Solid Films 214 48 (1992).Google Scholar
[6] Henager, C.H., Brinhall, J.L., and Hirth, J.P., Scripta Met. 26 585 (1992).Google Scholar
[7] , Landolt-Bömstein Numerical Data and Functional Relationships in Science and Technology, Group II Crystal and Solid State Physics, Vol. 1 Elastic, Piezoelectric, Piezooptic, and Electrooptic Constants of Crystals, Edited by Hellwege, K-H. and Hellwege, A.M. (Springer -Verlag, 1966).Google Scholar