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Structuring of Conducting Polymers by Ion Implantation

Published online by Cambridge University Press:  21 February 2011

Klaus Edinger ,
Stefanie Schiestel  and
Gerhard K. Wolf
Klaus Edinger
Affiliation:
Institute for Plasma Research, University of Maryland, College Park, MD
Stefanie Schiestel
Affiliation:
Institute for Plasma Research, University of Maryland, College Park, MD Institute for Physical Chemistry, University of Heidelberg, Germany Surface Modification Branch, NRL, Washington, D.C.
Gerhard K. Wolf
Affiliation:
Institute for Plasma Research, University of Maryland, College Park, MD Institute for Physical Chemistry, University of Heidelberg, Germany
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Abstract

Conducting polypyrrole polymer films have been modified by ion implantation. The resulting cross linking leads to changes in resistivity and electrochemical behaviour. By ion implantation through masks or with a focused ion beam lateral structures can be produced which can be imaged by scanning electron microscopy and optical absorption. The implanted polypyrrole layers can be removed by electrochemical treatment while not implanted regions can be electroplated. Therefore in combination with electrochemical treatment three dimensional structures have been generated and were investigated by atomic force microscopy. In order to study structures in the submicrometer range implantation experiments with a focused ion beam were performed and the minimal line widths were investigated by scanning electron microscopy.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 396: Symposium A – Ion-Solid Interactions for Materials Modification and Processing , 1995 , 317
Copyright
Copyright © Materials Research Society 1996

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References

1 Naarmann, H. and Theophilou, N., Syn. Met., 22, 1–8, 1987 Google Scholar
2 Molitori, A., Duroux, J.L. and Froyer, G., Nucl. Instr. Meth. Phys. Res. B34, 450–453, 1988 Google Scholar
3 Davenas, J., Dupuy, C., Long, X.X., Maitrot, M., Andre, J.J. and Francois, B., Rad. Eff., 74, 209–217, 1983 Google Scholar
4 Koshida, N. and Hirayama, N., Nucl. Instr. Meth. Phys. Res., B59/60, 1292–1294, 1983 Google Scholar
5 Jung, K.G., Schultze, J.W. and Buchai, Ch., Nucl. Instr. Meth. Phys. Res., B80/81, 1076–1079, 1993 Google Scholar
6 Schiestel, S., Ensinger, W. and Wolf, G.K., Nucl. Instr. Meth. Phys. Res., B91, 473–477, 1994 Google Scholar
7 Lin, S. and Sheng, K. and Bao, J. and Rong, T. and Zhou, Z. and Zhang, L. and Zhu, D. and Shen, Z. and Yan, M. Nucl. Instr. Meth. Phys. Res., B39, 778–782, 1989 Google Scholar
8 Schiestel, S. and Wolf, G.K., Syn. Met., 67, 273–276, 1994 Google Scholar
9 Freeh, G., Ensinger, W., Müller, H., Hans, M. and Wolf, G.K., Nucl. Instr. Meth. Phys. Res., B68, 402–407, 1992 Google Scholar
10 Schiestel, S., Wolf, G.K., Miller, Th. and Edinger, K., to be published in Proceedings IBMM 95Google Scholar
11 Ziegler, J.F. and Biersack, J.P., Trim code (91.04), 1991 Google Scholar