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Study of Surface Defects With the Reflected Electrons

Published online by Cambridge University Press:  26 February 2011

Tung Hsu*
Affiliation:
Department of Materials Science and Engineering, University of Utah, Salt Lake City, UT 84112, U.S.A.
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Abstract:

Studying crystal surfaces using the forward scattered high energy electrons Is discussed.Performance and applications of the basic REM and several variations of this technique are presented.

Type
Research Article
Copyright
Copyright © Materials Research Society 1991

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References

REFERENCES

1. “Reflection high-energy electron diffraction and reflection electron imaging of surfaces”,eds. Larsen, P.K. and Dobson, P.J., NATO ASI series B: Physics Vol.188, Plenum press, NY(1988).Google Scholar
2. A special issue on current research on reflection electron microscopy, J. Electron Microscopy Tech., in press.Google Scholar
3. Hsu, Tung, Petrich, G.S. and Cohen, P.I, in Proceedings of the XIIth International Congress for Electron Microscopy, Seattle, (1990) vol. 4, pp. 720721.Google Scholar
4. Fujiwara, K., Kanamoto, K., Ohta, Y.N., Tokuda, Y., and Nakayama, Y., J. Cryst. Growth,80:104(1987).Google Scholar
5. Hsu, Tung and Kim, Y.T., Ultramicroscopy, (1990).Google Scholar
6. Osakabe, N., Tanishiro, Y., Yagi, K., and Honjo, G., Surface Sci., 102:424 (1981).Google Scholar
7. Peng, L. M. and Cowley, J. M., Acta Cryst. , A42:545 (1986).Google Scholar
8. Peng, L. M., Cowley, J. M., and Hsu, Tung, Micron and Microscopia Acta, 18/3:179(1987).Google Scholar
9. Ma., Y. Dissertation, Ph.D., Northwestern University (1990).Google Scholar
10. Banzhof, H., Hermann, K.H., and Uchte, H., in Proceedings of the 9th European Congress on Electron Microscopy,Vol. 1:264 (1988).Google Scholar
11. Osakabe, N., Matsuda, T., Endo, J. and Tonomura, A., Japan J. Appl. Phys. 27:L1772(1988).Google Scholar
12. Takeguchi, M., Harada, K., and Shimizu, R., I. Electron Microsc. 39:269 (1990).Google Scholar
13. Hsu, Tung, lijima, Sumio, and Cowley, J. M., Surface Sci., 137: 551 (1984).Google Scholar
14. Peng, L. M. and Cowley, J. M., Micron and Microscopia Acta, 18/3:171 (1987).Google Scholar
15. Hsu, Tung and Cowley, J. M. , in “The Structure of Surfaces”, eds. Van Hove, M. A. and Tong, S. Y., Springer, Berlin (1985) pp. 5559.Google Scholar
16. Yagi, K., Takayanagi, K., and Honjo, G., In “Crystals, Growth, Properties, and Applications 7”, Springer-Verlag, Berlin (1982) pp. 4774.Google Scholar
17. Yagi, K., J. Appl. Crys. 20(June):147 (1987).Google Scholar
18. Lehmpfuhl, G. and Uchida, Y., Surface Sci., 235:295 (1990).Google Scholar
19. Crozier, P.A., Gajdardziska-Josifovska, M., and Cowley, J.M., Proceedings of the Xllth International Congress for Electron Microscopy, Seattle, (1990) V. 4, p. 280.Google Scholar
20. Hsu, Tung and Kim, Y.T., Surface Sci., in press.Google Scholar
21. Hsu, Tung, J. Vac. Sci. Technol., B 3:1035 (1985).Google Scholar
22. Yamamoto, N., Japanese J. of Appl. Phys. 28:L 2147 (1989).Google Scholar
23. Faist, L., Ganiere, J.-D., Buffat, Ph., Sampson, S., and Reinhart, F.-K., J. Appl. Phy.,66:1023 (1989).CrossRefGoogle Scholar
24. Latyshev, A.V., Aseev, A.L., Krasilnikov, A.B., and Stenin, S.I., Surface Sci., 213:157 (1989).Google Scholar
25. Uchida, Y., Lehmpfuhl, G., and Jtger, J., Ultramicroscopy, 13:119 (1984).CrossRefGoogle Scholar
26. Twomey, T., Uchida, Y., Lehmpfuhl, G. and Kolb, D.M., Zeitschrift for Physikalische Chemie Neue Folge, 160/S:1 (1988).Google Scholar
27. Wang, Z.L. and Howie, A., Surface Sci., 226:293 (1990)Google Scholar
28. Claverie, A., Faure, J., Vieu, C., Beauvillain, J., and Jouffrey, B., J. Physique, 47:1805 (1986).Google Scholar
29. Cowley, J. M., J. Electron Microsc., 36:72 (1987).Google Scholar
30. Wang, Z. L. and Egerton, R.F., Surface Sci., 205:25 (1988)CrossRefGoogle Scholar
31. Liu, J. and Cowley, J. M., private communication.Google Scholar
32. Smith, D.A. and Treacy, M.M.J., Appl. Surface Sci., 11/12:131(1982).Google Scholar
33. Kuroda, K., Hosoki, S. and Komoda, T., J. Electron Microscopy, 34:179 (1985).Google Scholar
34. Uchida, Y., Weiberg, G., and Lehmpfuhl, G., J. Electron Microscopy Tech., in press.Google Scholar
35. Liu, J., Crozier, P.A., and Cowley, J.M., in Proceedings of the XIIth International Congress for Electron Microscopy, Seattle, (1990) V.1, p. 334.Google Scholar
36. Ino, S., Endo, A., and Daimon, H, in Proceedings of the Third International Conference on the Structure of Surfaces 1990 Milwaukee.Google Scholar
37. Spence, J.C.H., Lo, W. and Kuwabara, M., Ultramicroscopy, 33:69 (1990).CrossRefGoogle Scholar
38. Kondo, Y., Yagi, K., Kobayashi, K, Kobayashi, H., and Yanaka, Y., in Proceedings of the XIlth International Congress for Electron Microscopy, Seattle, (1990) vol. 1, pp. 350351.Google Scholar