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A Study of Titanium Silicide Polycide Etching
Published online by Cambridge University Press: 25 February 2011
Abstract
The reactive ion etching of polycide films (TiSi2 over polysilicon) is discussed. Experimental conditions which lead to anisotropy and the identification of certain contamination problems as well as their solution are presented.
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- Copyright © Materials Research Society 1987
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