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Supercritical Fluid Deposition of Ruthenium Thin Films: A Kinetic Study

Published online by Cambridge University Press:  01 February 2011

Christos F. Karanikas  and
James J. Watkins
Christos F. Karanikas
Affiliation:
ckaranik@acad.umass.edu, University of Massachusetts - Amherst, Chemical Engineering, 120 Governors Drive, Amherst, MA, 01003, United States, 413-545-9685, 413-545-1647
James J. Watkins
Affiliation:
watkins@polysci.umass.edu, University of Massachusetts, Polymer Science and Engineering, Amherst, MA, 01003, United States
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Abstract

The kinetics of the deposition of ruthenium thin films from the hydrogen assisted reduction of bis(2,2,6,6-tetramethyl-3,5-heptanedionato)(1,5-cyclooctadiene)ruthenium(II), [Ru(tmhd)2cod], in supercritical carbon dioxide was studied in order to develop a rate expression for the growth rate as well as to determine a mechanism for the process. The deposition temperature was varied from 240°C to 280°C and the apparent activation energy was 45.3 kJ/mol. Deposition rates up to 30 nm/min were attained. The deposition rate dependence on precursor concentrations between 0 and 0.2 wt. % was studied at 260°C with excess hydrogen and revealed first order deposition kinetics with respect to precursor at concentrations lower then 0.06 wt. % and zero order dependence at concentrations above 0.06 wt. %. The effect of reaction pressure on the growth rate was studied at a constant reaction temperature of 260°C and pressures between 159 bar to 200 bar and found to have no measurable effect on the growth rate.

Keywords

metalorganic depositionkineticsRu
Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 992: Symposium D – Deposition on Nonplanar Substrates , 2007 , 0992-D02-02
Copyright
Copyright © Materials Research Society 2007

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References

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