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Thermoelectric Properties of TiS2 type materials

Published online by Cambridge University Press:  01 February 2011

Edward E. Abbott
Affiliation:
Department of Chemistry, Clemson University, Clemson SC 29634
Joseph W. Kolis
Affiliation:
Department of Chemistry, Clemson University, Clemson SC 29634
Nathan D. Lowhorn
Affiliation:
Department of Physics, Clemson University, Clemson SC 29634
William Sams
Affiliation:
Department of Physics, Clemson University, Clemson SC 29634
Terry M Tritt
Affiliation:
Department of Physics, Clemson University, Clemson SC 29634
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Abstract

TiS2 belongs to a family of layered compounds that displays promise as a thermoelectric material. At room temperature the thermopower (a) of TiS2 displays an n-type behavior, with a magnitude of ≈ -200 μV/K. The electrical resistivity (ρ), is on the order of 1 mΩ-cm at room temperature and displays a “metallic-like” behavior with dR/dT > 0 from 300 K to 10 K. Thus, these compounds exhibit relatively large power factors (PF = α2/ρ) with a PF ∼30 μW/K2 cm at T = 300 K, which are comparable to the state-of-the art Bi2Te3 type materials, which have a PF ∼40 μW/K2, at T = 330K. These values suggest that further investigations of these systems could be profitable. Thin plate-like crystals of TiS2 are grown by the iodine vapor transport method with planar dimensions of 1 cm and thicknesses of 20 μm or more. In this synthetic approach some dopants can be integrated into the parent compound, effectively providing a route for the tuning of electronic properties. We present here some effects of elemental doping on the electronic properties in these TiS2 based materials.

Type
Research Article
Copyright
Copyright © Materials Research Society 2004

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