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Thin Film Processing for High-Tc Superconductors of Bi-System

Published online by Cambridge University Press:  28 February 2011

K. Wasa ,
H. Adachi ,
K. Hirochi ,
Y. Ichikawa  and
K. Setsune
K. Wasa
Affiliation:
Central Res. Labs. Matsushita Elec. Co. Ltd. Moriguchi, Osaka 570, JAPAN
H. Adachi
Affiliation:
Central Res. Labs. Matsushita Elec. Co. Ltd. Moriguchi, Osaka 570, JAPAN
K. Hirochi
Affiliation:
Central Res. Labs. Matsushita Elec. Co. Ltd. Moriguchi, Osaka 570, JAPAN
Y. Ichikawa
Affiliation:
Central Res. Labs. Matsushita Elec. Co. Ltd. Moriguchi, Osaka 570, JAPAN
K. Setsune
Affiliation:
Central Res. Labs. Matsushita Elec. Co. Ltd. Moriguchi, Osaka 570, JAPAN
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Abstract

Basic thin film deposition processes for the high-Tc superconductors of Bi-systems are described. There appear several superconducting phases including the low-Tc phase Bi2Sr2Ca1 Cu2Ox and the high-Tc phase Bi2Sr2Ca2Cu3Ox. Thin films with these superconducting phases are synthesized by a selection of the substrate temperature Ts during the deposition : the high-Tc phase with Tc=100K is synthesized at Ts>800 °C; the low-Tc phase with Tc=80K, at Ts<600°C. However, these films often comprise show structure comprizing the different superconducting phases.

The close control of the superconducting phase has been achieved by the layer-by-layer deposition in the atomic layer epitaxy process.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 169: Symposium M – High Temperature Superconductors: Fundamental Properties and Novel Materials Processing , 1989 , 537
Copyright
Copyright © Materials Research Society 1990

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