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Thin Films of Diamond-Like Carbon

Published online by Cambridge University Press:  22 February 2011

David B. Kerwin
Affiliation:
Dept. of Physics, Colorado State Univ., Ft. Collins, CO 80523, U.S.A. Now with MOSTEK, Garden of the Gods Road, Colorado Springs, CO
Bruno Daudin
Affiliation:
Laboratoire des Accelerateurs, Centre d'Etudes Nucleaires, Grenoble 38, France
Michel Dubus
Affiliation:
Laboratoire des Accelerateurs, Centre d'Etudes Nucleaires, Grenoble 38, France
J. Fontenille
Affiliation:
Dept. de Recherche Fondamentale de Grenoble, Centre d'Etudes Nucleaires, Grenoble 38, France
Raymond S. Robinson
Affiliation:
Dept. of Physics, Colorado State Univ., Ft. Collins, CO 80523, U.S.A.
Ian L. Spain
Affiliation:
Dept. of Physics, Colorado State Univ., Ft. Collins, CO 80523, U.S.A.
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Abstract

Thin films of hard, diamond-like, carbon have been deposited on glass, silicon and sapphire substrates using three different ion beam deposition techniques: (a) ion beam sputter-deposition from a graphite target, (b) sputter-deposition with simultaneous bombardment of the growing film using a second ion beam, (c) primary ion deposition using a beam extracted from an Ar-hydrocarbon plasma. Structural, mechanical optical and electrical properties were measured. It was found that the hydrogen content controlled the internal (compressive) stress and that relatively stress-free films contained ,∼ 30 atomic % H (average). The H content could be correlated with the H/C arrival ratio from the gas phase. Optical absorption and luminescence measurements gave a band gap of '∼, 1 ev with band-tailing. Resistivity measurements and their temperature dependence fitted variable range hopping models. Hardnesses were ≿ 7 Mohs. The properties of the films were consistent with a mixture of sp3 and sp2 bonds in an amorphous, hydrogenated structure.

Type
Research Article
Copyright
Copyright © Materials Research Society 1985

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References

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