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TiO2:Ce/CeO2 High Performance Insulators For Thin Film Electroluminescent Devices

Published online by Cambridge University Press:  10 February 2011

A. R. Bally
Affiliation:
Institute of Applied Physics, EPFL, Lausanne, Switzerland, schmid@ipasg.epfl.ch
K. Prasad
Affiliation:
Institute of Applied Physics, EPFL, Lausanne, Switzerland, schmid@ipasg.epfl.ch
R. Sanjinés
Affiliation:
Institute of Applied Physics, EPFL, Lausanne, Switzerland, schmid@ipasg.epfl.ch
P. E. Schmid
Affiliation:
Institute of Applied Physics, EPFL, Lausanne, Switzerland, schmid@ipasg.epfl.ch
F. Lévy
Affiliation:
Institute of Applied Physics, EPFL, Lausanne, Switzerland, schmid@ipasg.epfl.ch
J. Benoit
Affiliation:
Laboratoire d'Acoustique et Optique de la Matière Condensée, Université P. et M. Curie, Paris, France, cbp@aomc.jussieu.fr
C. Barthou
Affiliation:
Laboratoire d'Acoustique et Optique de la Matière Condensée, Université P. et M. Curie, Paris, France, cbp@aomc.jussieu.fr
P. Benalloul
Affiliation:
Laboratoire d'Acoustique et Optique de la Matière Condensée, Université P. et M. Curie, Paris, France, cbp@aomc.jussieu.fr
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Abstract

The electrical properties of titanium dioxide thin films have been stabilised by cerium doping. These films have a high permittivity between 35 to 45 and withstand 650°C. Multilayer TiO2:Ce/CeO2 insulators have been fabricated. The breakdown voltage is increased by a factor 10 with a modest decrease in the permittivity (30 – 35 instead of 35 – 45).

Electroluminescent devices (ELDs) with a classical ZnS:Mn phosphor have been prepared using TiO2:Ce as the first insulator and a TiO2:Ce/CeO2 multilayer as the second insulator. Compared with a standard ELD based on Y2O3 insulators, devices with the new insulators show a significant decrease of the threshold voltage along with a notable increase of the brightness. An important increase is also achieved in the total device efficiency which is maintained over a large range of brightness and transferred charge. Consequences of rapid thermal annealing and conventional thermal treatments on device performance have also been investigated.

Type
Research Article
Copyright
Copyright © Materials Research Society 1997

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