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Two- and three-Dimensional Refractive Index Lattices Formed by Laterally Patterned Porous Silicon Layers
Published online by Cambridge University Press: 10 February 2011
Abstract
Porous silicon was used to fabricate refractive index lattices. Patterned n-doping and/ or substrate etching were used to introduce lateral periodicity. By anodizing p-type substrate with an n-doped area, we realized large refractive index contrast two-dimensional lattices with underlying cladding layer. The anodization process showed an effect specific to the small dimensional patterning and this effect has significant influence on the formed refractive index structure.
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- Copyright © Materials Research Society 2000