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Ultrapure Iron Film Formation by Mass-Separated Ion Beam Deposition Method

Published online by Cambridge University Press:  25 February 2011

Kiyoshi Miyake ,
Kenya Ohashi  and
Matahiro Komuro
Kiyoshi Miyake
Affiliation:
Hitachi Research Laboratory, 7–1–1 Ohmika-cho, Hitachi, Ibaraki 319–12 Japan
Kenya Ohashi
Affiliation:
Hitachi Research Laboratory, 7–1–1 Ohmika-cho, Hitachi, Ibaraki 319–12 Japan
Matahiro Komuro
Affiliation:
Hitachi Research Laboratory, 7–1–1 Ohmika-cho, Hitachi, Ibaraki 319–12 Japan
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Abstract

Isotopically enriched iron (56Fe or 57Fe) films were deposited on Si(100) substrates at RT by a low-energy (50–500 eV), mass-separated ion beam deposition (IBD) method. All the IBD-Fe films had smooth and fine-grained polycrystalline bcc-structure, and showed superior electrochemical corrosion resistance against both NaCl and H2SO4 solutions compared with die highest-purity (RRRIH=6000) iron metals ever reported. A distinct energy dependence of the degree of corrosion resistance and different microcrystalline structures observed by TEM cross-sections for the 50 eV- and 100 eV-IBD-Fe films indicate that their film growth modes are completely different.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 279: Symposium A – Beam-Solid Interactions–Fundamentals and Applications , 1992 , 787
Copyright
Copyright © Materials Research Society 1993

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References

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