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Void Formation in Thin Semiconducting Film Under Ion Implantation

Published online by Cambridge University Press:  15 February 2011

V. A. Zhikharev
Affiliation:
Zavoisky Physical Technical Institute, Kazan, 420029, RUSSIAN FEDERATION.
F. R. Batyrshin
Affiliation:
Zavoisky Physical Technical Institute, Kazan, 420029, RUSSIAN FEDERATION.
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Abstract

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Type
Research Article
Copyright
Copyright © Materials Research Society 1995

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References

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