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Volatile, Fluorine-Free β-Ketoiminate Precursors for MOCVD Growth of Lanthanide Oxide Thin Films
Published online by Cambridge University Press: 10 February 2011
Abstract
Lanthanide oxide thin films are of increasing scientific and technological interest to the materials science community. A new class of fluorine-free, volatile, low-melting lanthanide precursors for the metal-organic chemical vapor deposition (MOCVD) of these films has been developed. Initial results from a full synthetic study of these lanthanide-organic complexes are detailed.
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- Copyright © Materials Research Society 2000