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ADF-STEM Imaging of Strained GaN0.045As0.955 Epitaxial Layers on (100) GaAs Substrates

Published online by Cambridge University Press:  01 February 2011

X. Wu
Affiliation:
xiaohua.wu@nrc.ca, National Research Council of Canada, Institute for Microstructural Sciences, Building M50, Rm 190G, 1200 Montreal Rd, Ottawa, K1A0R6, Canada, (613)993-7823, (613)952-6337
M.D. Robertson
Affiliation:
michael.robertson@acadiau.ca, Acadia University, Department of Physics, Wolfville, NS B4P2R6, Canada
J.A. Gupta
Affiliation:
james.gupta@nrc.ca, National Research Council of Canada, Institute for Microstructural Sciences, Ottawa, ON K1A0R6, Canada
J.-M. Baribeau
Affiliation:
jean-marc.baribeau@nrc.ca, National Research Council of Canada, Institute for Microstructural Sciences, Ottawa, ON K1A0R6, Canada
J.C. Bennett
Affiliation:
craig.bennett@acadiau.ca, Acadia University, Department of Physics, Wolfville, NS B4P2R6, Canada
M. Kawasaki
Affiliation:
kawasaki@jeol.com, JEOL USA, Peabody, MA, MA 01960, United States
T. Aoki
Affiliation:
aoki@jeol.com, JEOL USA, Peabody, MA, MA 01960, United States
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Abstract

The annular dark field (ADF) image contrast of a 0.92% tensile strained GaN0.045As0.955 layer on GaAs substrate was studied with a scanning transmission electron microscope (STEM) as a function of ADF detector inner semi-angles ranging from 28 mrad to 90 mrad. The GaN0.045As0.955 layers were brighter than the surrounding GaAs for the values of ADF detector semiangle up to 65 mrad, and the measured contrast decreased with increasing ADF detector inner semi-angle. For a 37 nm thick specimen, the GaN0.045As0.955 intensity is about 13% higher than that of GaAs in the 28 mrad ADF detector inner semi-angle. Multislice simulations show that the displacement around substitutional N atoms plays an important role in the observed ADF-STEM contrast, while the contribution to the contrast due to misfit strain between GaN0.045As0.955 and GaAs is small.

Type
Research Article
Copyright
Copyright © Materials Research Society 2007

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