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Aerosol Deposition and Film Formation using Silicon Powder
Published online by Cambridge University Press: 28 February 2011
Abstract
An electrostatic deposition process which utilizes charged particle motion in an electric field has been successfully developed as a method for depositing coatings of silicon films. Coatings have been deposited on conducting, Insulating, and semiconducting surfaces after making suitable changes in deposition parameters. This process along with parameters Important to the deposition process which Include particle charge and size characteristics are discussed. These coatings are subsequently heat treated. Experimental results for depositions on silicon substrates are presented. Characterization in terms of chemical, electrical and physical properties of the film are presented.
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- Copyright © Materials Research Society 1991