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Applications of Ion Track Lithography in Vacuum Microelectronics

Published online by Cambridge University Press:  14 March 2011

Ronald G. Musket*
Affiliation:
Materials Science and Technology Division Lawrence Livermore National Laboratory Livermore, CA 94550, USA
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Abstract

When a high-velocity (i.e., typically > 0.1 MeV/amu) ion passes through a material it can change the properties of the material within a cylindrical zone centered on the essentially straight trajectory of the ion. The electronic bonding, phase, and density are among the properties modified in the zone, which is called a latent nuclear, or ion, track. Because the diameters of latent ion tracks are typically less than 20 nm, selective chemical etching is generally employed to improve the detection and assessment of the tracks. Historically, etched nuclear tracks have been used mainly for nuclear particle identification, geochronology, measurement of extremely low-dose radiation levels, and creation of membrane filters.

Type
Research Article
Copyright
Copyright © Materials Research Society 2000

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References

REFERENCES

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