Hostname: page-component-77c89778f8-sh8wx Total loading time: 0 Render date: 2024-07-20T20:31:10.001Z Has data issue: false hasContentIssue false

ATMOSPHERIC PRESSURE MICROWAVE PLASMA ENHANCED COATING OF CARBON NANOTUBE RIBBONS

Published online by Cambridge University Press:  21 July 2011

Rutvij Kotecha
Affiliation:
Materials Engineering, School of Energy, Environment, Biological & Medical Engineering (SEEBME), University of Cincinnati, Cincinnati, OH, USA 45221
A. Davison Gilpin
Affiliation:
Materials Engineering, School of Energy, Environment, Biological & Medical Engineering (SEEBME), University of Cincinnati, Cincinnati, OH, USA 45221
Chaminda Jayasinghe
Affiliation:
Materials Engineering, School of Energy, Environment, Biological & Medical Engineering (SEEBME), University of Cincinnati, Cincinnati, OH, USA 45221
Mark Schulz
Affiliation:
Mechanical Engineering Department, University of Cincinnati, Cincinnati, OH, USA 45221 Co-director Nanoworld Lab, University of Cincinnati, Cincinnati, OH, USA 45221
Vesselin Shanov
Affiliation:
Materials Engineering, School of Energy, Environment, Biological & Medical Engineering (SEEBME), University of Cincinnati, Cincinnati, OH, USA 45221 Co-director Nanoworld Lab, University of Cincinnati, Cincinnati, OH, USA 45221
Get access

Abstract

CNT arrays were synthesized by Chemical Vapor Deposition (CVD) and spun into ribbons, which were coated using Atmospheric Pressure Microwave Plasma system. Time-of-Flight Secondary Ion Mass Spectrometry (TOF-SIMS) characterization of CNT ribbons indicated the presence of polymer films with CF2 as a repeat unit. Atomic concentration of C, F and O in the coated films was estimated from X-ray Photoelectron Spectroscopy (XPS) data. Types of bonding between the elements in the coated films was studied by curve fitting of C 1s XPS spectra.

Type
Research Article
Copyright
Copyright © Materials Research Society 2011

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

[1] Feng-Lei, Zhou, Gong, Rong-Hua, Porat, Isaac, “Nano-coated hybrid yarns using electrospinning,” Surface & Coatings Technology, vol. 204, pp. 34593463, 2010.Google Scholar
[2] Wylie, S. R., Al-Shamma’a, A. I., Lucas, J., “Microwave Plasma System for Material Processing,” IEEE Transactions on Plasma Science, vol. 33, 04 2005 2005.Google Scholar
[3] Nikolov Shanov, S. D. Vesselin, Farhad Miralai, Seved, Andrew McDaniel, John, “Apparatus and method for treating a workpiece using plasma generated from microwave radiation,” United States Patent.Google Scholar
[4] Kumar, Virendra, Pulpytel, Jerome, Arefi-Khonsari, Farzaneh, “Fluorocarbon Coatings Via Plasma Enhanced Chemical Vapor Deposition of 1H,1H,2H,2Hperfluorodecyl Acrylate-1, Spectroscopic Characterization by FT-IR and XPS,” Plasma Processes and Polymers vol. 7, 2010.Google Scholar
[5] Jessie Lue, Shingjiang, Hsiaw, Shiang-Yiaw, Wei, Ta-Chin, “Surface modification of perfluorosulfonic acid membranes with perfluoroheptane (C7F16)/argon plasma,” Journal of Membrane Science, vol. 305, 2007.Google Scholar
[6] Briggs, D., Brown, A., Vickerman, J., “Handbook of Static Secondary Ion Mass Spectrometry,” p. 24, 1989.Google Scholar
[7] Brown, A., Vickerman, J. C., “A Comparison of Positive and Negative Ion Static SIMS Spectra of Polymer Surfaces,” Surface and Interface Analysis, vol. 8, 1986.Google Scholar
[8] Kwon, Ji Hye, Youn, So Won, Kang, Yong-Cheol, “XPS Investigation of A3 Coupling Reaction in Room Temperature Ionic Liquids,” Bulletin of the Korean Chemical Society, vol. 27.Google Scholar
[9] Riddle, J., “SEMASPEC Test Method for XPS Analysis of Surface Composition and Chemistry of Electropolished Stainless Steel Tubing for Gas Distribution System Components,” SEMATECH Inc.Google Scholar
[10] Yang, G. H., Oh, S. W., Kang, E. T., Neoh, K. G., “Plasma polymerization and deposition of linear, cyclic and aromatic fluorocarbons on (100)-oriented single crystal silicon substrates,” Journal of Vacuum Science & Technology A, vol. 20, 2002.Google Scholar