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Control of Etching of LiNbO3, by Implant Damage Profile Tailoring
Published online by Cambridge University Press: 26 February 2011
Abstract
Damage-profile tailoring using multi-energy ion implants can produce smooth side walls and deeper etched features with ion-bombardment-enhanced wet etching of LiNb03 than is possible with a single-energy implant. High ion fluences can produce buried microcracks which may contribute to propagation losses commonly observed in ion-implanted waveguides.
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- Copyright © Materials Research Society 1998