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Crystal Ion-Slicing of Magnetic and Ferroelectric Oxide Films
Published online by Cambridge University Press: 10 February 2011
Abstract
The epitaxial separation of single-crystal magnetic and ferroelectric oxide films is presented. Ion implantation is used to create a buried damage layer beneath the surface. The high etch-selectivity of this sacrificial layer makes it possible to detach high quality single-crystal films from bulk samples. Magnetic and electrical properties of the films are discussed.
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- Copyright © Materials Research Society 1998
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