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Diffusion Limited Aggregation of PMMA Stereocomplex in Thin Films

Published online by Cambridge University Press:  17 March 2011

Yves Grohens ,
Gilles Castelein ,
Pascal Carriere  and
Jiri Spevacek
Yves Grohens
Affiliation:
Laboratoire Polymères et Procédés, Université de Bretagne Sud, Centre de Recherche, rue St Maudé, BP 92116, 56321 Lorient Cedex, France
Gilles Castelein
Affiliation:
Institut de Chimie des Surfaces et Interfaces-CNRS, 15, rue J. Starcky, BP 2488, 68057, Mulhouse Cedex, France
Pascal Carriere
Affiliation:
Institut de Chimie des Surfaces et Interfaces-CNRS, 15, rue J. Starcky, BP 2488, 68057, Mulhouse Cedex, France
Jiri Spevacek
Affiliation:
Institute of Macromolecular Chemistry, Academy of Sciences of the Czech Republic, 16206 Prague 6, Czech Republic
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Abstract

The nanoscale patterns formed by poly(methyl methacrylate) (PMMA) stereocomplexes at the surface of silicon wafers, glass and mica, were investigated by tapping mode atomic force microscopy (TM-AFM). The effects of the solvent nature, PMMA concentration, i/s-ratio (stoechimetry) and surface nature on the morphology of the stereocomplex thin layer at a surface were addressed. The aggregation phenomena are well described by the diffusion limited cluster-cluster aggregation model (DLA) and the fractal exponent D calculated. The i/s-ratio strongly influences the fractal exponent D which is equal to 1.35 for the 1:2 ratio is lower than for the other i:s ratios which are 1.46, 1.61, 1.82 for 1:1, 2:1 and 4:1 ratios, respectively. The low values of the fractal dimension D are indicative of a fast aggregation process and higher values of D correspond to a slow aggregation process.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 710: Symposia DD – Polymer Interfaces and Thin Films , 2001 , DD4.3.1
Copyright
Copyright © Materials Research Society 2002

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References

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