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Investigation of Dynamical Temperature Behaviour in Rtp

Published online by Cambridge University Press:  21 February 2011

Gunnar Leitz ,
JÖrg Pezoldt ,
Ingo Patzschke ,
Jens-Peter ZÖllner  and
G. Eichhorn
Gunnar Leitz
Affiliation:
Technische Universität Ilmenau, Institut für Festkörperelektronik, Postfach 327, 0-6300 Ilmenau, Germany
JÖrg Pezoldt
Affiliation:
Technische Universität Ilmenau, Institut für Festkörperelektronik, Postfach 327, 0-6300 Ilmenau, Germany
Ingo Patzschke
Affiliation:
Technische Universität Ilmenau, Institut für Festkörperelektronik, Postfach 327, 0-6300 Ilmenau, Germany
Jens-Peter ZÖllner
Affiliation:
Technische Universität Ilmenau, Institut für Festkörperelektronik, Postfach 327, 0-6300 Ilmenau, Germany
G. Eichhorn
Affiliation:
Technische Universität Ilmenau, Institut für Festkörperelektronik, Postfach 327, 0-6300 Ilmenau, Germany
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Abstract

For Rapid Thermal Processing one of the essential problems is the dynamical temperature controlling to reduce temperature nonhomogeneities during heating up and cooling down, which are responsible for layer nonhomogeneities and slip generation. A pyrometer row consisting of five sensors is used for temperature distribution measurement in radial direction, which allows to investigate the dynamical behaviour during the heating cycles. Together with a developed software tool, which is suitable for calculation of the dynamical temperature distribution across the wafer under process conditions where the convective heat losses can be neglected, the influence of heating-up velocities is investigated. The obtained results show that in a scalar controlled system process conditions optimized for steady state lead to maximum temperature nonhomogeneity during the heating-up period, due to the changing heat balance in the system.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 303: Symposium G – Rapid Thermal and Integrated Processing II , 1993 , 171
Copyright
Copyright © Materials Research Society 1993

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References

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