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Effects of Oxygen on Diamond Growth

Published online by Cambridge University Press:  26 February 2011

Stephen J. Harris  and
Anita M. Weiner
Stephen J. Harris
Affiliation:
Physical Chem. Dept., General Motors Research Labs, Warren, MI 48090
Anita M. Weiner
Affiliation:
Physical Chem. Dept., General Motors Research Labs, Warren, MI 48090
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Abstract

In situ mass spectral measurements of the gas composition at the substrate surface were made during filament-assisted diamond growth. The input gases were various mixtures of CH4, O2, and H2 chosen in order to discern the effects of oxygen addition on diamond formation and growth. The gas phase chemistry was modeled as a 1-dimensional flow reactor, and the measured and calculated species mole fractions were in good agreement. The model was then used to estimate mole fractions of several atomic and radical species which could not be measured. We find that addition of O2 has only a small effect on the radical mole fractions. However, O2 can reduce the effective initial hydrocarbon mole fraction, which is important because higher quality diamond is grown at lower initial hydrocarbon mole fraction. Most importantly, perhaps, O2 addition leads to the formation of sufficient gas phase OH to remove non-diamond (pyrolytic) carbon from the film. Thus, O2 addition allows diamond films to be grown under composition and temperature conditions which otherwise would produce largely non-diamond carbon.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 162: Symposium F – Diamond, Silicon Carbide and Related Wide Bandgap Semiconductors , 1989 , 103
Copyright
Copyright © Materials Research Society 1990

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References

REFRENCES

1. Tsuda, M., Nakajima, M., and Oikawa, S., J. Am. Chem. Soc. 108, 5780 (1986).Google Scholar
2. Frenklach, M. and Spear, K.E., J. Mater. Res. 3, 133 (1988).Google Scholar
3. Harris, S.J., Weiner, A.M., and Perry, T.A., Appl. Phys. Lett. 53, 1605 (1988).Google Scholar
4. Harris, S.J., J. AppL Phys. 65, 3044 (1989).Google Scholar
5. Harris, S.J., Belton, D.N., Weiner, A.M., Schmieg, S.J., J. AppL Phys., 66, 5353 (1989).Google Scholar
6. Celii, a. F.G., Pehrsson, P.E., Wang, H.-t, and Butler, J.E., AppL Phys. Left., 52, 2045 (1988). b. F.G. Celii, P.E. Pehrsson, H. -t Wang, and J.E. Butler “In-situ detection of gas phase species in the filament-assisted diamond growth environment,” Advances in Laser Sciences IV, W.C. Stwalley and J. Cole, eds., AIP Conference Proceedings, to be published.Google Scholar
7. Belton, D.N., Harris, S.J., Schmieg, S.J., Weiner, A.M., and Perry, T.A., AppL Phys. Lett., 54, 416 (1989).Google Scholar
8. Belton, D.N., Schmieg, S.J., J. Appl Phys., 66, 4223 (1989).Google Scholar
9. Kawato, T. and Kondo, K., Jap. J. Appl. Physics 26, 1429 (1987).Google Scholar
10. Chen, C., Huang, Y.C., Hosomi, S., and Yoshida, I., Mat. Res. BulL 24, 87 (1989).Google Scholar
11. Chang, C.-P., Flamm, D.L., Ibbotson, D.E., and Mucha, J.A., J. AppL Physics 63, 1744 (1988).Google Scholar
12. Mucha, J.A., Flamm, D.L., and Ibbotson, D.E., J. Appl. Physics 65, 3448 (1989).Google Scholar
13. Harris, S.J., Weiner, A.M., and Blint, R.J., Comb. Flame 72, 91 (1988).Google Scholar
14. Sloane, T.M., Combast. Sci. Tech. 63, 287 (1989).Google Scholar
15. Mucha, J.A., personal communication.Google Scholar
16. Hiroee, Y. and Terasawa, Y. Jpn. J. Appl. Phys. 25, L591 (1986).Google Scholar
17. Walls, J.R. and Strickland-Constable, R.F., Carbon, 1, 333 (1964).Google Scholar
18. Neoh, K.G., Howard, J.B., and Sarofim, A.F. in Particulate Carbon Formation During Combustion, Siegla, D.C. and Smith, G.W., eds., Plenum Press, New York, 1981, p. 261.Google Scholar
19. Wicke, B.G. and Grady, K.A., Combust. Flame 69, 185 (1987).Google Scholar
20. Liou, Y., Inspektor, A., Weimer, R., and Messier, R., ”Low Temperature Diamond Deposition by Microwave Plasma CVD,” Poster Paper TP7, SDIO/IST-ONR Diamond Technology Initiative Symposium, Crystal City, VA, July, 1989.Google Scholar