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Epitaxial Semiconductor Structures for the Infrared: Where Are We Now?

Published online by Cambridge University Press:  25 February 2011

Morton B. Panish*
Affiliation:
AT&T Bell Laboratories Murray Hill, New Jersey 07974
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Extended abstract

The use of epitaxial structures for the generation, detection, and modulation of light has had as its strongest driving force the development of fiber optic communications systems. Partly for that reason, the semiconductor materials systems that can be most readily optimized for wavelengths (800-1600nm) transmittable through state-of-the-art optical fibers, have been the most well developed. It also appears that the communications community has been most fortunate in that the semiconductor systems required, although far more difficult to deal with than Si, are relatively benign compared to those that operate at significantly shorter or longer wavelengths. Two developments that are now more than 15 years old initiated the extensive studies of compound semiconductor epitaxial structures that are now so important. These were the introduction of the heterostructure concept in the study of injection lasers and light emitting diodes (1), and the realization that lattice matched isoelectronic epitaxial layers, consisting in part of solid solutions between the binary compounds, would permit such structures to be grown.

Type
Research Article
Copyright
Copyright © Materials Research Society 1987

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References

REFERENCES

Hayashi, I. and Panish, M. B., J. Appl. Phys. 41, 150 (1970)CrossRefGoogle Scholar
2. “Molecular Beam Epitaxy and Heterostructures,” Chang, L. L. and Ploog, K., Editors, NATO ASI Series, Series E: Applied Science- No. 87, Martinus Nijhoff Publishers, Boston 1985 Google Scholar
3. Dupuis, R. D., Science 226, 623 (1984)CrossRefGoogle Scholar
4. Panish, M. B., Prog. Crystal Growth and Charact. 12, 1 (1986)CrossRefGoogle Scholar
5. Panish, M. B., J. Cryst. Growth. In press.Google Scholar
6. Tsang, W. T., J. Electron. Mat. 15, 235 (1986)CrossRefGoogle Scholar
7. Mohammed, K., Capasso, F., Allam, J., Cho, A. Y., and Hutchinson, A. L., Appl. Phys. Lett. 47, 597 (1985)CrossRefGoogle Scholar
8. Onabe, Kentaro, Japn. J. Appl. Phys. 21, L323 (1982)CrossRefGoogle Scholar
9. Faurie, J. P. and Million, A., J. Cryst. Growth 54, 582 (1981)CrossRefGoogle Scholar
10. Lu, P.-Y., Wang, C. -H., Williams, L. M., Chu, S. N. G., and Stiles, C. M., Appl. Phys. Lett. 49, 1372 (1986)CrossRefGoogle Scholar
11. Levine, B. F., Choi, K. K., Bethia, C. G., Walker, J. and Malik, R. Appl. Phys. Lett. In press.Google Scholar