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Fabrication of nano-needle arrays on diamond surface by reactive ion etching

Published online by Cambridge University Press:  29 February 2012

T. Misu ,
K. Koh  and
T. Arai
T. Misu
Affiliation:
Department of Home Electronics Engineering, Kanagawa Institute of Technology, 1030 Shimo-Ogino, Atsugi 243-0292, Japan
K. Koh
Affiliation:
Department of Home Electronics Engineering, Kanagawa Institute of Technology, 1030 Shimo-Ogino, Atsugi 243-0292, Japan
T. Arai
Affiliation:
Department of Electrical and Electronic Engineering, Kanagawa Institute of Technology, 1030 Shimo-Ogino, Atsugi 243-0292, Japan
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Abstract

CVD polycrystalline diamond surfaces were etched using reactive ion etching system with either a conventional stainless steel electrode or MgO sintered ceramic containing electrode. The micro-needle array of high aspect on diamond substrate surfaces obtained with MgO electrode was fabricated by using back-sputtering from MgO electrode. The RMS roughness of diamond substrate surfaces obtained with MgO electrode is higher than those obtained with stainless steel electrode.

Keywords

diamondnanostructurereactive ion etching
Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 1395: Symposium N – Diamond Electronics and Biotechnology–Fundamentals to Applications V , 2012 , mrsf11-1395-n12-46
Copyright
Copyright © Materials Research Society 2012

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References

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