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Free-standing line patterns of nanocrystalline electrodeposits
Published online by Cambridge University Press: 17 March 2011
Abstract
Free-standing Cu- and Ni-line patterns with varying line dimensions in the range of a few micrometers were manufactured by means of electrodeposition through a lithographically prepared mask. XRD studies revealed for Cu-lines a pronounced influence of the pattern geometry on crystallographic texture and peak broadening. Information on the strain distribution within individual Cu-lines was obtained from FEM.
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- Copyright © Materials Research Society 2004