Hostname: page-component-7479d7b7d-wxhwt Total loading time: 0 Render date: 2024-07-12T18:19:23.391Z Has data issue: false hasContentIssue false
  • English
  • Français

Growth of TiO2 Thin Films by Pulsed Laser Evaporation

Published online by Cambridge University Press:  16 February 2011

Ming Y. Chen  and
P. Terrence Murray
Ming Y. Chen
Affiliation:
Wright Research & Development Center, WRDC/MLBM, Wright-Patterson AFB, OH 45433– 6533
P. Terrence Murray
Affiliation:
Institute, University of Dayton, Dayton OH 45469
Get access

Abstract

Thin films of TiO2 have been grown by pulsed laser evaporation. The films were analyzed by in-situ Auger and x-ray photoelectron spectroscopy as well as by ex-situ grazing incidence xray diffraction. Films grown at room temperature and at a pressure of 5×10minus; 3 Torr were oxygen deficient. Films grown at 500°C and higher were found to be stoichiometric TiO2.The effect of substrate temperature and evaporation conditions on film properties will be discussed.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 191: Symposium N – Laser Ablation for Materials Synthesis , 1990 , 43
Copyright
Copyright © Materials Research Society 1990

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

1. Gardos, M. N., presented at 43rd STLE Annual Meeting, Cleveland, OH(1988)Google Scholar
2. Pawlewicz, W. T. et al., Optical Thin Films 325 102 (1982)Google Scholar
3. Schiller, S. et al., Thin Solid Films 72 475 (1980)Google Scholar
4. Geraghty, K. G. and Donaghey, L. F., J. of the Electrochem. Soc., 123, 1021 (1976)Google Scholar
5. Yamashita, T., Robinson, J. W., and Yamauchi, H., in High Tech Ceramics, Elsevier Science Publisher, 649, 1987.Google Scholar
6. Fitzgibbons, E. T., Sladek, K. J. and Hartwig, W. H., J. Electrochem. Soc. 119 735 (1972)Google Scholar
7. Mavroides, J. G. et al., Mat. Res. Bull. 10 1023 (1975)Google Scholar
8. Dubowski, J. B., Williams, D. F., Sewell, P. B., and Norman, P., Appl. Phys. Lett. 46, 1081 (1985).Google Scholar
9. Chen, M. Y. and Murray, P. T., J. Mater. Sci., in pressGoogle Scholar
10. Wu, X. D., Inam, A., Venkatesan, T., Chang, C. C., Chase, E. W., Barboux, P., Tarascon, J. M., and Wilkens, B., Appl. Phys. Lett. 52, 754 (1988).Google Scholar
11. Donley, M. S., McDevitt, N. T., Haas, T. W., Murray, P. T., and Grant, J. T., Thin Solid Films, 168, 335 (1989).Google Scholar
12. Cheung, J. T., “Growth of Thin Films by Laser-Induced Evaporation”, CRC Reviews in Materials Science (in press).Google Scholar
13. Murray, P. T., Wolf, J. D., Mescher, J. A., Grant, J. T., and McDevitt, N. T., Mater. Lett. 5, 250 (1987).Google Scholar
14. Sayers, C. N. and Armstrong, N. R., Surface Science 72,301 (1978)Google Scholar
15. C. N. R. Rao et al., Proc. R. Soc. London Ser. A. 367, 239 (1979)Google Scholar