Hostname: page-component-78c5997874-g7gxr Total loading time: 0 Render date: 2024-11-19T18:03:12.380Z Has data issue: false hasContentIssue false
  • English
  • Français

In-Situ Temperature Control for Rtp Via Thermal Expansion Measurement

Published online by Cambridge University Press:  21 February 2011

Bruce Peuse  and
Allan Rosekrans
Bruce Peuse
Affiliation:
Peak Systems, Inc., 3550 West Warren Avenue, Fremont, CA 94070
Allan Rosekrans
Affiliation:
Peak Systems, Inc., 3550 West Warren Avenue, Fremont, CA 94070
Get access

Abstract

A new method of temperature control for rapid thermal processing of silicon wafers is presented whereby in-situ wafer temperature is determined by measurement of wafer thermal expansion via an optical micrometer mechanism. The expansion measurement technique and its implementation into a rapid thermal processing system for temperature control are described. Preliminary data show the wafer to wafer temperature repeatability to be 1% (3-σ) using this technique.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 303: Symposium G – Rapid Thermal and Integrated Processing II , 1993 , 125
Copyright
Copyright © Materials Research Society 1993

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

1. Donnelly, V. M. and McCaulley, J. A., J. Vac. Sci. Technol. A 8 (1) (Jan/Feb 1990).Google Scholar
2. Voorhes, D.W. and Hall, D.M., SPIE Rapid Thermal and Integrated Processing, (1595) 61 (1991).CrossRefGoogle Scholar
3. Zaidi, S. H., Brueck, S. R. J. and McNeil, J. R., J. Vac. Sci. Technol. B 10 (1) (Jan/Feb 1992).Google Scholar
4. Hercher, M., Wyntjes, G., DeWeerd, H., Proc. SPIE, (746) 185 (1987).CrossRefGoogle Scholar
5. Okada, Y. and Tokumara, Y., J. Appl. Phys. 56 (2) 314 (1984).CrossRefGoogle Scholar
6. Peak Systems Horizon rapid thermal processor. μTempTm is a registered trade name for the Peak System thermal expansion temperature control system. Patent pending. Peak Systems Inc., Fremont, CA.Google Scholar
7. Lord, H. A., IEEE Trans. on Semi. Mftg., 1 (3) 105 (1988).CrossRefGoogle Scholar