Hostname: page-component-7bb8b95d7b-lvwk9 Total loading time: 0 Render date: 2024-09-18T18:02:50.361Z Has data issue: false hasContentIssue false

Laser-Induced Formation of Thin Silicone Layers with High Purity

Published online by Cambridge University Press:  21 February 2011

W. Roth
Affiliation:
Siemens Research Laboratories, P.O. BOX 3220, D-8520 Erlangen, Federal Republic of Germany
H.-J. Henkel
Affiliation:
Siemens Research Laboratories, P.O. BOX 3220, D-8520 Erlangen, Federal Republic of Germany
K.W. Hoffmann
Affiliation:
Siemens Research Laboratories, P.O. BOX 3220, D-8520 Erlangen, Federal Republic of Germany
H. Markert
Affiliation:
Siemens Research Laboratories, P.O. BOX 3220, D-8520 Erlangen, Federal Republic of Germany
Get access

Abstract

Unsaturated and saturated oligomeric siloxanes were polymerized by laser irradiation in the UV range without the use of photoinitiators. The obtained silicon layers possess high purity and non-corrosive effects.

Type
Research Article
Copyright
Copyright © Materials Research Society 1989

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

1. Sumiyoshi, T., Schnabel, W., Henne, A. and Lechtken, P., Polymer 26, 141 (1985).Google Scholar
2. Sumiyoshi, T. and Schnabel, W., Makromol. Chem. 186, 1811 (1985).Google Scholar
3. Sumiyoshi, T., Schnabel, W. and Henne, A., J. Photochem. _30, 63 (1980).Google Scholar
4. Decker, C., J. Polym., Polym. Chem. Ed. 21, 2451 (1983); Polym. Photochem. 3, 131 (1983).Google Scholar
5. Noll, W., Chemie und Technologie der Silicone, 2. Aufl. (Verlag Chemie, Weinheim, 1968).Google Scholar