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Metallisation and Silicidation of Porous Silicon
Published online by Cambridge University Press: 22 February 2011
Abstract
Thin films of cobalt, rhenium, or cobalt silicide have been deposited down the pores of porous silicon layers, using HCo(CO)4, HRe(CO)5, and SiH3Co(CO)4 as precursors in a Chemical Vapour Infiltration and Decomposition (CVID) technique.
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- Research Article
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- Copyright © Materials Research Society 1993
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