Hostname: page-component-7479d7b7d-wxhwt Total loading time: 0 Render date: 2024-07-12T01:41:36.124Z Has data issue: false hasContentIssue false
  • English
  • Français

Modelling of Plasma Processes

Published online by Cambridge University Press:  15 February 2011

Maher I. Boulos
Maher I. Boulos*
Affiliation:
Department of Chemical Engineering, University of Sherbrooke, Sherbrooke, Quebec, Canada, JiK 2R1
Get access

Abstract

A review is made of some of the mathematical modelling work carried out over the last few years with the objective of computing the flow and temperature fields for different thermal plasma systems. Typical results are given for d.c. plasma jets, transfered and non-transfered arc plasma reactors and for inductively coupled plasma torches. This is followed by a brief discussion of the important problem of plasma-particle heat transfer.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 30: Symposium L – Plasma Processing and Synthesis of Materials I , 1983 , 53
Copyright
Copyright © Materials Research Society 1984

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

1. Elenbaas, W. Physica, 2, 169 (1935).Google Scholar
2. Heller, G., Physica, 6 389 (1935).Google Scholar
3. Watson, V.R. and Pegot, E.R., NASA, TN, D–4042 (1967).Google Scholar
4. Pfender, E., “Electric arcs and arc gas heaters” Gaseous electronics. Ed. Hirsh, M.N. and Oskam, H.J., Academic press, Vol 1, 291–398 (1978).Google Scholar
5. Pfender, E., Pure and Applied Chemistry, 52, 1773 (1980).Google Scholar
6. Dinuleseu, H.A. and Pfender, E., J. Appl. Phys., 51, 3149 (1980).Google Scholar
7. Chen, D.M. and Pfender, E., IEEE, Trans. Plasma Sci., PS–8, 252 (1980).Google Scholar
8. Chen, D.M. and Pfender, E., IEEE, Trans. Plasma Sci., PS–9, 265 (1981).Google Scholar
9. Chen, D.M., Hsu, K.C. and Pfender, E., Plasma Chemistry and Plasma processing, 1, 295 (1981).Google Scholar
10. Mazza, A. and Pfender, E., ISPC-6, Montreal, 1, 41 (1983).Google Scholar
11. Young, R.M., Chyon, Y.P., Fleck, E. and Pfender, E., ISPC-6, Montreal, 1, 211 (1983).Google Scholar
12. Donaldson, C.P. and Gray, K.E., AIAAJ, 4, 2017 (1966).Google Scholar
13. Boulos, M.I. and Gauvin, W.H., C.J.Ch.E., 52, 355 (1974).Google Scholar
14. McKellizet, J., Szekely, J., Vardelle, M. and Fauchais, P., Plasma Chemistry and Plasma Processing, 2, 317 (1982).Google Scholar
15. Correa, S.M., ISPC-6, Montreal, 1, 77 (1983).Google Scholar
16. Vardelle, A., Baronet, J.M., Vardelle, M. and Fauchais, P., IEEE, Trans. Plasma Sc., PS–8, 417 (1980).Google Scholar
17. Boulos, M.I. and Barnes, R.M., “Induction plasma modelling, state-of-theart”, Developments in Atomic plasma Spectrochemical analysis, Barnes, R.M. Ed., Heyden Press p 20 (1981).Google Scholar
18. Freeman, M.P. and Chase, J.D., J.Appl. Phys., 39, 180 (1968).Google Scholar
19. Eckert, H.U., J. Appl. Phys., 41, 1520 (1970).Google Scholar
20. Eckert, H.U., J. App1. Phys., 41 1529 (1970).Google Scholar
21. Mensing, A.E. and Boedeker, L.R., NASA CR-1312 (1969).Google Scholar
22. Pridmore-Brown, D.C., J. Appl. Phys., 41, 3621 (1970).Google Scholar
23. Keefer, D.R., Sprouse, J.A., and Loper, F.C., IEEE, Trans. PL. Sc., PS–1, 71 (1973).Google Scholar
24. Miller, R.J. and Ayen, J.R., J. Appl. Phys., 40, 5260 (1969).Google Scholar
25. Barnes, R.M. and Schleicher, R.G., Spectrochim Acta, B–30, 109 (1975).Google Scholar
26. Barnes, R.M. and Nikdel, S., Appl. Spectroscopy, 29, 477 (1975).Google Scholar
27. Barnes, R.M. and Nikdel, S., J. Appl. Phys., 47, 3929 (1976).Google Scholar
28. Delettrez, J.A., “A numerical calculation of the flow and electrical characteristics of an argon induction discharge, Ph.D. thesis, U. of Calif., Davis (1974).Google Scholar
29. Boulos, M.I., IEEE Trans. PL. Sc., PS–4, 28 (1976).Google Scholar
30. Boulos, M.I., Gagng, R. and Barnes, R.M., C.J.Ch.E., 58, 367 (1980).Google Scholar
31. Mostaghimi, J., Proulx, P. and Boulos, M.I., “An analysis of the computer modelling of the flow and temperature fields in an inductively coupled plasmas, to be published (1984).Google Scholar
32. Mostaghimi, J., Proulx, P. and Boulos, M.I., “Parametric study of the flow and temperature fields in an inductively coupled r.f. plasma torch, to be published (1984).Google Scholar
33. Bhattacharya, D. and Gauvin, W.H., AIChEJ, 21, 879 (1975).Google Scholar
34. Gal-Or, B., J. of Eng. for power, 102, 589 (1980).Google Scholar
35. Fiszdon, J.K., Int. Heat & Mass Transfer, 22, 749 (1979).Google Scholar
36. Vardelle, M., Vardelle, A., Fauchais, P. and Boulos, M.I., AIChEJ, 2 236 (1983).Google Scholar
37. Wei, D., Correa, S.M., Apelian, D. and Paliwal, M., ISPC-6, Montreal, 1, 83 (1983).Google Scholar
38. Boulos, M.I., IEEE, Trans. PL. Sc., PS–6, 93 (1978).Google Scholar
39. Yoshida, T. and Akashi, K., J. Appl. Phys., 48, 2252 (1977).Google Scholar
40. Bourdin, E., Fauchais, P. and Boulos, M.I., Int. J. H. & M. T., 26, 567 (1983).Google Scholar
41. Xi, Chen and Pfender, E., Plasma Chemistry and Plasma Processing, 2, 293 (1982).Google Scholar
42. Xi, Chen and Pfender, E., Plasma Chemistry and Plasma Processing, 2, 185 (1982).Google Scholar
43. Xi, Chen and Pfender, E., Plasma Chemistry and Plasma Processing, 3, 97 (1983).Google Scholar
44. Xi, Chen and Pfender, E., Plasma Chemistry and Plasma Processing, 3, 351 (1983).Google Scholar