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Molecular-Dynamics Study of the Morphological Evolution of a Metallic Cluster Deposited on a Surface

Published online by Cambridge University Press:  01 February 2011

Kazuhito Shintani
Affiliation:
shintani@mce.uec.ac.jp, University of Electro-Communications, Department of Mechanical Engineering and Intelligent Systems, 1-5-1 Chofugaoka, Chofu, Tokyo, 182-8585, Japan, 81-424-43-5393, 81-424-84-3327
K. Terajima
Affiliation:
terajima@nmst.mce.uec.ac.jp, University of Electro-Communications, Department of Mechanical Engineering and Intelligent Systems, 1-5-1 Chofugaoka, Chofu, Tokyo, 182-8585, Japan
Y. Kometani
Affiliation:
kometani@nmst.mce.uec.ac.jp, University of Electro-Communications, Department of Mechanical Engineering and Intelligent Systems, 1-5-1 Chofugaoka, Chofu, Tokyo, 182-8585, Japan
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Abstract

The morphological evolution of a Co cluster deposited on a Cu substrate is investigated by means of molecular-dynamics simulation. The many-body potential based on the second moment approximation of a tight-binding Hamiltonian (TB-SMA) is employed to calculate the interactions between Co and Cu atoms. The results show that the effect of the substrate anisotropy appears in the morphology of a deposited cluster. It is also revealed that the total period of the structural change of such a cluster can be divided into the three stages, viz., (I)change to an epitaxial structure, (II)overspread of diffusing Cu atoms on the cluster, and (III)solid dissolution of Co atoms into the Cu substrate.

Type
Research Article
Copyright
Copyright © Materials Research Society 2006

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References

1. Sun, S., Murray, C. B., Weller, D., Folks, L., and Moster, A., Science 287, 1989 (2000).Google Scholar
2. Zimmermann, C. G., Nordlund, K., Yeaden, M., Gibson, J. M., Averback, R. S., Herr, U., and Samwer, K., Phys. Rev. B 64, 085419 (2001).Google Scholar
3. Frantz, J. and Nordlund, K., Phys. Rev. B 67, 075415 (2003).Google Scholar
4. Silly, F. and Castell, R., Appl. Phys. Lett. 87, 053106 (2005).Google Scholar
5. Shintani, K., Taniguchi, Y., and Kameoka, S., J. Appl. Phys. 95, 8207 (2004).Google Scholar
6. Rosato, V., Guillope, M., and Legrand, B., Philos. Mag. A 59, 321 (1989).Google Scholar
7. Mazzone, G., Rosato, V., and Pintore, M., Phys. Rev. B 55, 837 (1997).Google Scholar
8. Kitakami, O., Sato, H., Shimada, Y., Sato, F., and Tanaka, M., Phys. Rev. B 56, 13849 (1997).Google Scholar