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Preparation of Self-Patterned SrBi2Ta2O9 Thin Films from Photo-Sensitive Solutions

Published online by Cambridge University Press:  10 February 2011

Nobuyuki Soyama
Affiliation:
Central Research Institute, Mitsubishi Materials Corporation, 1–297 Kitabukuro-cho, Omiya, Saitama 330 Japan
Hiroto Uchida
Affiliation:
Central Research Institute, Mitsubishi Materials Corporation, 1–297 Kitabukuro-cho, Omiya, Saitama 330 Japan
Kensuke Kageyama
Affiliation:
Central Research Institute, Mitsubishi Materials Corporation, 1–297 Kitabukuro-cho, Omiya, Saitama 330 Japan
Katsumi Ogi
Affiliation:
Central Research Institute, Mitsubishi Materials Corporation, 1–297 Kitabukuro-cho, Omiya, Saitama 330 Japan
Michael C. Scotit
Affiliation:
Symetrix Corporation, 5055 Mark Dabling Blvd., Suite 100, Colorado Springs, CO 80918
J. D. Cuchiaro
Affiliation:
Symetrix Corporation, 5055 Mark Dabling Blvd., Suite 100, Colorado Springs, CO 80918
G. F. Derbenwick
Affiliation:
Symetrix Corporation, 5055 Mark Dabling Blvd., Suite 100, Colorado Springs, CO 80918
Larry D. Mcmillan
Affiliation:
Symetrix Corporation, 5055 Mark Dabling Blvd., Suite 100, Colorado Springs, CO 80918
Carlos A. Paz De Araujo
Affiliation:
Symetrix Corporation, 5055 Mark Dabling Blvd., Suite 100, Colorado Springs, CO 80918
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Abstract

Photo-sensitive SrBi2Ta2O9 (SBT) solutions were evaluated and the patterning process flow for SBT films using the solutions was optimized. By adding a soft-bake process before UVirradiation, self-patterned SBT films were successfully prepared from the solutions and the cross sectional shape of the patterned films was improved. The photo-sensitivity of the solutions was estimated to be 900 mJ/cm2. The photo-reaction in the precursor gel film formed from the solution was traced by measuring IR absorption spectra. The obtained films had excellent ferroelectric properties comparable to conventional SBT films.

Type
Research Article
Copyright
Copyright © Materials Research Society 1996

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References

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