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Reactive Sputtering Deposition of Titanium Oxide Films By Means of An RF Triode Sputtering Source
Published online by Cambridge University Press: 28 February 2011
Abstract
TiOx thin films were fabricated by means of a reactive sputtering technique in an rf triode sputtering-deposition unit. The deposition rate was studied in detail. A ‘phase diagram’ of TiOx was determined. XPS study showed the formation of a Ti02 surface layer on TiOx thin films. Oxygen was removed by the Ar+ bombardment on Ti02 to yield Ti203.
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- Copyright © Materials Research Society 1986